Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of manufacturing semiconductor device and substrate processing apparatus










Image Number 4 for United States Patent #8110491.

A manufacturing method of a semiconductor device of the present invention includes the step of forming an insulating film on a substrate, and the step of forming a high dielectric constant insulating film on the insulating film, and the step of forming a titanium aluminum nitride film on the high dielectric constant insulating film, wherein in the step of forming the titanium aluminum nitride film, formation of an aluminum nitride film and formation of a titanium nitride film are alternately repeated, and at that time, the aluminum nitride film is formed firstly and/or lastly.








 
 
  Recently Added Patents
Imidazo[1,2-B]pyridazine and pyrazolo[1 .5-A]pyrimidine derivatives and their use as protein kinase inhibitors
Optical article including an antireflecting coating having antifog properties and process for making same
Communications in an asynchronous cellular wireless network
Vehicle control apparatus
Data processing apparatus, activation control method, and computer-readable storage medium
Spin transition material
Maize variety hybrid X13A495
  Randomly Featured Patents
Humidity resistant aqueous urethane/acrylic resins and coating compositions
Method and apparatus of searching for base station using paging procedure in mobile communication network
Internet hotspots localization using satellite systems
Grip for an interdental brush
N-state ripple adder scheme coding with corresponding n-state ripple adder scheme decoding
Counterbalancing shaft accommodating structure
Semiconductor device with two different threshold voltages
Hinged rain gutter
Apparatus for controlling cooling device and cooling system
Keyless entry control apparatus