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Processing liquid mixing apparatus and method, substrate processing apparatus, and storage medium










Image Number 2 for United States Patent #8104948.

A processing liquid mixing apparatus and method capable of maintaining a mixing ratio of the processing liquid produced in a mixing tank constant, a substrate processing apparatus including the processing liquid mixing apparatus, and a storage medium storing a program for controlling the processing liquid mixing apparatus are disclosed. Discharge valves are first open and supply valves are close to discharge stock solutions to an outside through the discharge valves. After all flow rates of the stock solutions detected by LFC reach a predetermined flow rate, the discharge valves are close and the supply valves are open to supply the stock solutions to the second mixing tank through the supply valves.








 
 
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