Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of enhancing lithography capabilities during gate formation in semiconductors having a pronounced surface topography










Image Number 6 for United States Patent #8101512.

In a mesa isolation configuration for forming a transistor on a semiconductor island, an additional planarization step is performed to enhance the uniformity of the gate patterning process. In some illustrative embodiments, the gate electrode material may be planarized, for instance, on the basis of CMP, to compensate for the highly non-uniform surface topography, when the gate electrode material is formed above the non-filled isolation trenches. Consequently, significant advantages of the mesa isolation strategy may be combined with a high degree of scalability due to the enhancement of the critical gate patterning process.








 
 
  Recently Added Patents
Pyrrolidine derivatives, pharmaceutical compositions containing the same, and methods of using the same
Device in a system operating with CAN-protocol and in a control and/or supervision system
Manipulation of an alternative respiratory pathway in photo-autotrophs
Identifying conceptually related terms in search query results
Method and system for tracking mobile electronic devices while conserving cellular network resources
Pre-sealing unit for wire-cut electric discharge machine
High sensitivity stress sensor based on hybrid materials
  Randomly Featured Patents
Novel organic fertilizer and production thereof
Pressure-regulating valve with automatic release
Enhanced timer queue mechanism for dynamic capacity increase
Dual valve fitting for enabling quick measurement of pressure
Method and apparatus for synchronizing communications between networked computers
Laminated structure comprising 4-methylpentene-1 bonded to thermoplastic resin layer
Voice-over-IP hybrid digital loop carrier
Method and apparatus for embedding auxiliary data in a primary data signal using frequency and time domain processing
Photothermographic material
System and method for protecting assets using wide area network connection