Resources Contact Us Home
Method and system for evaluating an evaluated pattern of a mask

Image Number 5 for United States Patent #8098926.

A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.

  Recently Added Patents
Automated dynamic differential data processing
Soft co-processors to provide a software service function off-load architecture in a multi-core processing environment
Semiconductor memory device
Systems and methods for adaptive error thresholds or adaptive modulation schemes based on atmospheric conditions
Illuminating device
Tire for motorcycle
Gate timing for short servo wedge in disk memory systems
  Randomly Featured Patents
Setting device, component mounting system, program and calculating method
Coordinate measuring machine with covers
Stringed instrument support
Exterior mirror assembly
Imaging apparatus controller and control method thereof, image processing apparatus and method thereof, and program code and storage medium
Wiring substrate
Method and device for allocating a broadcast channel in a wireless mobile communication system
Soft-error rate hardened pulsed latch
Hypodermic syringe
Plant stand