Resources Contact Us Home
Method and system for evaluating an evaluated pattern of a mask

Image Number 5 for United States Patent #8098926.

A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern.

  Recently Added Patents
Photoelectric conversion apparatus
Modulation of TIM receptor activity in combination with cytoreductive therapy
Method and apparatus for reacquiring lines in a cache
Trash receptacle
Semiconductor IC including pulse generation logic circuit
Method and apparatus for supporting delivery, sale and billing of perishable and time-sensitive goods such as newspapers, periodicals and direct marketing and promotional materials
  Randomly Featured Patents
Controllable ultrafast light shutter
Light-weight portable folding boat
Sprayed liquid dispensing apparatus
Tissue characterization based on impedance images and on impedance measurements
Digital detection of blockers for wireless receiver
Circuit and method for detecting the state of a switch
Preparation of DNA-containing extract for PCR amplification
Process for making polyetherimides
Combined bathtub faucet and hand shower
Method and apparatus for operating gas turbine engines