Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Modified DARC stack for resist patterning










Image Number 3 for United States Patent #8084366.

A method of making a device includes forming a device layer, forming an organic hard mask layer over the device layer, forming a first oxide hard mask layer over the organic hard mask layer, forming a DARC layer over the first oxide hard mask layer, forming a photoresist layer over the DARC layer, patterning the photoresist layer to form a photoresist pattern, and transferring the photoresist pattern to the device layer using the DARC layer, the first oxide hard mask layer and the organic hard mask layer.








 
 
  Recently Added Patents
RPM Controlled Wind Power Generation System
Semiconductor device, integrated circuit and method of manufacturing an integrated circuit
Device and method to automatically configure port forwarding
Toner cartridge and image forming apparatus including the same
EpCAM as a reprogramming factor for non-pluripotent cells
Decrementing settings for a range of power caps when a power cap is exceeded
Plasmon generator includes three metal layers for thermally-assisted magnetic recording
  Randomly Featured Patents
Storage box
Double driver mop bucket
Carboxy-terminal BRCA1 interacting protein
Method of manufacturing short-circuiting member
Method and apparatus for shift-by-wire in a motor vehicle
Method and apparatus for electrically connecting two objects
Apparatus for connecting and sealing together two lengths of cylinder barrel of a worm extruder
Voltage regulator with charge pump
Radio receiver
Intelligent adaptive index density in a database management system