Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Modified DARC stack for resist patterning










Image Number 3 for United States Patent #8084366.

A method of making a device includes forming a device layer, forming an organic hard mask layer over the device layer, forming a first oxide hard mask layer over the organic hard mask layer, forming a DARC layer over the first oxide hard mask layer, forming a photoresist layer over the DARC layer, patterning the photoresist layer to form a photoresist pattern, and transferring the photoresist pattern to the device layer using the DARC layer, the first oxide hard mask layer and the organic hard mask layer.








 
 
  Recently Added Patents
Fragrance compounds
Touchscreen with extended conductive pattern
Earphone
Apparatus and method for storing event information for an HVAC system
System and apparatus for control of published content
Devices, systems, and methods for tactile feedback and input
Crystalline form of zofenopril calcium
  Randomly Featured Patents
Test device and method for determining a component in a sample
Piezoelectric energy generator
Method for focusing the growth of a vegetative root system to target a contaminated area
Icon for a display screen or packaging with surface ornamentation
Navigation system with physical activity safety mechanism and method of operation thereof
Unitized rotary rock bit
Preparation of cyanobenzyl cyclopropane carboxylates
Paint compositions
Apparatus for breaking an optical fibre
Passive target detection and identification system