Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Modified DARC stack for resist patterning










Image Number 3 for United States Patent #8084366.

A method of making a device includes forming a device layer, forming an organic hard mask layer over the device layer, forming a first oxide hard mask layer over the organic hard mask layer, forming a DARC layer over the first oxide hard mask layer, forming a photoresist layer over the DARC layer, patterning the photoresist layer to form a photoresist pattern, and transferring the photoresist pattern to the device layer using the DARC layer, the first oxide hard mask layer and the organic hard mask layer.








 
 
  Recently Added Patents
Clock distribution circuit
Supplier capability methods, systems, and apparatuses for extended commerce
Simplifying lexicon creation in hybrid duplicate detection and inductive classifier systems
Egg separator
Puncture resistant fabric
Layout design defect repair based on inverse lithography and traditional optical proximity correction
Making transparent capacitor with multi-layer grid
  Randomly Featured Patents
Core assembly for a flying magnetic head with magnetic gap on air-bearing surface
Plant farnesyltransferases
Intake device of an internal combustion engine
Method for making furnace lining
Lighting apparatus
Ground block connector
Agricultural planter with sled frame, vacuum dispensing and ground drive
Snowmobile
Gas discharge display device and a novel hollow cathode therefor
Method to create a high resolution database