Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Modified DARC stack for resist patterning










Image Number 3 for United States Patent #8084366.

A method of making a device includes forming a device layer, forming an organic hard mask layer over the device layer, forming a first oxide hard mask layer over the organic hard mask layer, forming a DARC layer over the first oxide hard mask layer, forming a photoresist layer over the DARC layer, patterning the photoresist layer to form a photoresist pattern, and transferring the photoresist pattern to the device layer using the DARC layer, the first oxide hard mask layer and the organic hard mask layer.








 
 
  Recently Added Patents
Sabatier process and apparatus for controlling exothermic reaction
Printing apparatus having extendable functionality and method thereof
Duty cycle adjustment of remote illumination source to maintain illumination output
Measuring device and measuring method that use pulsed electromagnetic wave
Touch panel structure and manufacturing method thereof
Contact detection between a disk and magnetic head
Method for generating multi-antenna signals
  Randomly Featured Patents
Lighter case
Method of making a frangible port protector
Combined travel cooler and warmer with AM/FM radio
Apparatus for controlling automatic transmission
Vehicle power head mounting structure
Plate or the like
Circuits and methods for selectively coupling redundant elements into an integrated circuit
Abrasion resistant diamond blade
High strength flexible film package utilizing thin film
SQL code generation for heterogeneous environment