Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Modified DARC stack for resist patterning










Image Number 3 for United States Patent #8084366.

A method of making a device includes forming a device layer, forming an organic hard mask layer over the device layer, forming a first oxide hard mask layer over the organic hard mask layer, forming a DARC layer over the first oxide hard mask layer, forming a photoresist layer over the DARC layer, patterning the photoresist layer to form a photoresist pattern, and transferring the photoresist pattern to the device layer using the DARC layer, the first oxide hard mask layer and the organic hard mask layer.








 
 
  Recently Added Patents
Wallet
Optical recording medium, and method for producing optical recording medium
Liquid composite compositions using non-volatile liquids and nanoparticles and uses thereof
Plants and seeds of hybrid corn variety CH336383
Per-request control of DNS behavior
Medical device arm
Universal handle extension for unloading butterfly valve for tank trailer or other vehicle
  Randomly Featured Patents
Device for limiting lateral canting of road vehicles
Focal plane array structure including a signal processing system
Clinching tool
Device for and method of secure computing using virtual machines
Vapor deposited film by plasma CVD method
Bioactive compounds
Rotary pump with better fluid sealing structure and brake apparatus having same
Selective messaging via on-screen display
Semiconductor switching device and method of controlling a carrier life time in a semiconductor switching device
Microphone system and microphone apparatus