Resources Contact Us Home
Plasma processing apparatus

Image Number 8 for United States Patent #8075733.

A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing electrode where a processing material, is placed and which holds the processing material in the chamber; and a vacuuming unit that is connected to the chamber to discharge the gas in the chamber, in which the chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the object-placing electrode, and the vacuuming unit are disposed coaxially with the center axis of the chamber, and the part for introducing a microwave includes a microwave rotation generator that rotates a polarization plane of the input microwave and supplies the microwave to the chamber.

  Recently Added Patents
Method and system for billing based on color component histograms
Parallel active optical cable
Thermoplastic resin composition
Endotracheal tube
Grounding fitting
Methods and apparatus for dynamic identification (ID) assignment in wireless networks
Trading related to fund compositions
  Randomly Featured Patents
Automatic original feeding device, and image reader and image forming apparatus using automatic original feeding device
Tensioned spoked bicycle wheel assembly and hub therefor
Food cutting device
Quality priority image storage and communication
Burner for a gaseous fuel
Gaseous ultrasound contrast media and method for selecting gases for use as ultrasound contrast media
Collapsible rocker chair
Golf putter head
Phase locked loop control system
Apparatus for continuously manufacturing stoichiometric Mg.sub.2Ni hydrogen storage compound