Resources Contact Us Home
Plasma processing apparatus

Image Number 8 for United States Patent #8075733.

A plasma processing apparatus includes: a decompression chamber of which the inside is depressed; a gas supply unit that supplies process gas into said chamber; a microwave supply unit that supplies a microwave into the chamber to generate plasma; an object-placing electrode where a processing material, is placed and which holds the processing material in the chamber; and a vacuuming unit that is connected to the chamber to discharge the gas in the chamber, in which the chamber, a part for providing gas into the chamber of the gas supply unit, a part for introducing a microwave into the chamber of the microwave supply unit, the object-placing electrode, and the vacuuming unit are disposed coaxially with the center axis of the chamber, and the part for introducing a microwave includes a microwave rotation generator that rotates a polarization plane of the input microwave and supplies the microwave to the chamber.

  Recently Added Patents
Buffer pool extension for database server
Method of manufacturing pipe with branch
Selective facsimile denial
Cover opening and closing unit and image forming apparatus including the same
Computing device with improved user interface for applications
Method for detecting motion of an electrical device or apparatus
Mobile phone
  Randomly Featured Patents
Human anti-CD40 antibodies
Fuel tank cap for a vehicle
Production of naphtha and light olefins
Retrievable plug
Bituminous compositions containing residues of hydrolyzed or alcoholized polymers
Phase synchronization of base stations via mobile feedback in multipoint broadcasting
Bottle with cap
Optical module for an optically based measurement system
Utilize ultrasonic energy to reduce the initial contact forces in known-good-die or permanent contact systems
Macrocellular acoustic foam containing particulate additive