Resources Contact Us Home
Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing

Image Number 11 for United States Patent #8075698.

A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

  Recently Added Patents
Tunnel magnetoresistance read head with narrow shield-to-shield spacing
Planarizing agents and devices
Simultaneous enhancement of transmission loss and absorption coefficient using activated cavities
Communication apparatus, integrated circuit, and communication method
System and method for burst separation and extended interleaving length
Toilet bowl
Combination therapy to enhance NK cell mediated cytotoxicity
  Randomly Featured Patents
Tetrahydropyridyl-alkyl-heterocycles, method for preparing the same and pharmaceutical compositions containing the same
Battery charging system and method for preventing false switching from fast charge to trickle charge
Video/image processing apparatus with motion estimation sharing, and related method and machine readable medium
Vehicle with an EL light strip
Image display apparatus and method
Non-contact sensor with particular utility for measurement of road profile
Redox method of forming a coaxial probe structure of elongated electrical conductors projecting from a support structure
SSB System with pilot coded squelch
Vehicle lower front bumper