Resources Contact Us Home
Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing

Image Number 11 for United States Patent #8075698.

A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

  Recently Added Patents
Secure Flash-based memory system with fast wipe feature
Computerized information and display methods
Terminal for flat test probe
Method and apparatus for controlled reoxygenation
Vehicle wheel
Case for electronic device
Method for manufacturing semiconductor element and semiconductor device, and deposition apparatus
  Randomly Featured Patents
Portion of a shoe outsole
Encryption switch processing
Clothes hanger storage device
Device for the separation of a liquid
Ball-point pen
Simultaneous bidirectional cable interface
Hand controller
Drive system for interconnecting attachment devices and handheld rotary power tools
Method of manufacturing semiconductor device and semiconductor device