Resources Contact Us Home
Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing

Image Number 11 for United States Patent #8075698.

A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

  Recently Added Patents
Controlling access to resources on a network
Handling errors in a data processing system
Resin composition and molded article
Advanced CAPTCHA using images in sequence
Normalized contextual performance metric for the assessment of fatigue-related incidents
Metal colloidal particles, metal colloid and use of metal colloid
Arbitration circuit to arbitrate conflict between read/write command and scan command and display driver integrated circuit having the same
  Randomly Featured Patents
Tool and method for engaging two members of a joint prosthesis
Apparatus and method for delivering CO.sub.2 laser energy
Signal transmitting cable
Salivary duct constriction apparatus
Electrical connector
Orthogonal ion sampling for APCI mass spectrometry
Memory device verification of multiple write operations
Wheeled platform
Adhesive composition for semiconductor device
Apparatus and method for manipulating transmission power in a wireless communication device