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Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing

Image Number 11 for United States Patent #8075698.

A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

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