Resources Contact Us Home
Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing

Image Number 11 for United States Patent #8075698.

A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

  Recently Added Patents
Wafer level package and fabrication method
Communication apparatus, communication method, and program for exchanging data with a target
Wireless communication system
Anti-proliferative and anti-inflammatory agent combination for treatment of vascular disorders with an implantable medical device
Image processing apparatus and method configured to calculate defocus amount of designated area
Note tab
Wire guide
  Randomly Featured Patents
Plasma processing apparatus and plasma processing method
Automobile tire
Composite plastic pulley
Fill and pressurization apparatus
Fused-bicyclic lactams as interleukin-1.beta. converting enzyme inhibitors
Phase sensitive model adaptation for noisy speech recognition
Non-stage transmission control system
Visualizing birefringent structures in samples
Rotary-cutting disk for a centrifuge for a centrifuge with a duct wall contoured in a wave shape