Resources Contact Us Home
Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing

Image Number 11 for United States Patent #8075698.

A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.

  Recently Added Patents
Device chip carriers, modules, and methods of forming thereof
System and method for testing an integrated circuit embedded in a system on a chip
Interactivity model for shared feedback on mobile devices
Semiconductor fin device and method for forming the same using high tilt angle implant
Semiconductor device and method of manufacturing the same
Dose escalation enzyme replacement therapy for treating acid sphingomyelinase deficiency
Selecting a converter operating mode of a PA envelope power supply
  Randomly Featured Patents
Method for preparing starch ether derivatives
Management of data before zero volt suspend in computer power management
Methods for making ceramic matrix composites using precursor polymers to refractory metal carbides and metal borides
Keyboard mounting apparatus for a portable computer
Wafer cassette transportation method and system thereof
Tonnage regulating structure and a mold incorporating same
Intracranial catheter assembly for precise treatment of brain tissue
Motorcycle rear disc brake
.alpha.-sulfin-and .alpha.-sulfonamino acid amides
Unhydrolyzed jojoba protein products having high simmondsin concentration