Resources Contact Us Home
High-rate groove pattern

Image Number 3 for United States Patent #8062103.

The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad. The polishing pad comprises a center, an inner region surrounding the center, a transition region connecting grooves from the inner region to an outer region surrounding the inner region. The outer region has multiple grooves with a high-rate path. The transition region is adjacent the outer region and within a radius from the center defined as follows: .times..times..times..times..times..times. ##EQU00001## ##EQU00001.2## .times..function..times..theta..times..times..function..times..theta..tim- es..times..times..times..times..theta..times..times. ##EQU00001.3## with the inner region originating continuous grooves that extend uninterrupted to the outer region.

  Recently Added Patents
Variable speed traffic control system
Communication apparatus, integrated circuit, and communication method
Categorization of design rule errors
Tandem electric machine arrangement
Benzimidazole inhibition of biofilm formation
Lubricant coating device and image forming apparatus
Optical cable plug-in detection
  Randomly Featured Patents
Holding and actuating device for pressurized can
Apparatus for determining the distances of points on a surface from a reference axis
External electrode for heart stimulation and connector therefor
Dynamic microphone
Electronic file transfer for a communications device
Adjustable ramp helix
Quick release locking latch for a panel mount connector
Stacked redundant blowers
Method for manufacturing a gate structure incorporating aluminum oxide as a gate dielectric
Protective film for FPD, vapor deposition material for protective film and its production method, FPD, and manufacturing device for FPD protective film