Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
High-rate groove pattern










Image Number 3 for United States Patent #8062103.

The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad. The polishing pad comprises a center, an inner region surrounding the center, a transition region connecting grooves from the inner region to an outer region surrounding the inner region. The outer region has multiple grooves with a high-rate path. The transition region is adjacent the outer region and within a radius from the center defined as follows: .times..times..times..times..times..times. ##EQU00001## ##EQU00001.2## .times..function..times..theta..times..times..function..times..theta..tim- es..times..times..times..times..theta..times..times. ##EQU00001.3## with the inner region originating continuous grooves that extend uninterrupted to the outer region.








 
 
  Recently Added Patents
Rechargeable battery
Modular utility rack
Replacing memory pointers with implicit pointers to be used in compiler-generated debug output
Method and apparatus for using virtual machine technology for managing parallel communicating applications
Sliding-type portable communication device
Flash drive
Quaternary chalcogenide wafers
  Randomly Featured Patents
Scotch block attachment fitting
Load transference in grinding disks
System for preventing unauthorized activation of computer
Cable organizer and holder
Storage controller and storage control method for copying a snapshot using copy difference information
Internal combustion engine assembly
Organic electroluminescent display device and method for fabricating the same
Hydrostatic bearing for a radial piston machine
Dental apparatus and fluid reservoir for the same
Corn, callus and wart removing pads