Resources Contact Us Home
High-rate groove pattern

Image Number 3 for United States Patent #8062103.

The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad. The polishing pad comprises a center, an inner region surrounding the center, a transition region connecting grooves from the inner region to an outer region surrounding the inner region. The outer region has multiple grooves with a high-rate path. The transition region is adjacent the outer region and within a radius from the center defined as follows: .times..times..times..times..times..times. ##EQU00001## ##EQU00001.2## .times..function..times..theta..times..times..function..times..theta..tim- es..times..times..times..times..theta..times..times. ##EQU00001.3## with the inner region originating continuous grooves that extend uninterrupted to the outer region.

  Recently Added Patents
Display system with mounting assemblies and associated methods
Method and arrangement for controlling semiconductor component
Nutritional supplement method
Configurable memory controller/memory module communication system
Redistribution layer (RDL) with variable offset bumps
Radiation imaging device
Automated hotfix handling model
  Randomly Featured Patents
Video processing in which high frequency luminance components are folded into a mid-band spectrum
Combination fiberglass swimming pool and spa
Process cartridge, electrophotographic image forming apparatus and electrophotographic photosensitive drum unit
Firearm magazine lock
Method and system for controlling an alternator
Process and apparatus for separating fines from micella streams
ATM switching system connectable to I/O links having different transmission rates
Multiple map image projecting and fusing
Picture frame vise
Method of ensuring adhesion of chemically vapor deposited oxide to gold integrated circuit interconnect lines