Resources Contact Us Home
High-rate groove pattern

Image Number 3 for United States Patent #8062103.

The invention provides a polishing pad useful for polishing at least one of a magnetic, optical and semiconductor substrate in the presence of a polishing medium with a polishing pad. The polishing pad comprises a center, an inner region surrounding the center, a transition region connecting grooves from the inner region to an outer region surrounding the inner region. The outer region has multiple grooves with a high-rate path. The transition region is adjacent the outer region and within a radius from the center defined as follows: .times..times..times..times..times..times. ##EQU00001## ##EQU00001.2## .times..function..times..theta..times..times..function..times..theta..tim- es..times..times..times..times..theta..times..times. ##EQU00001.3## with the inner region originating continuous grooves that extend uninterrupted to the outer region.

  Recently Added Patents
Compression molding method and reinforced thermoplastic parts molded thereby
Apparatus and method for adapted deblocking filtering strength
Image-monitoring method for electroporation treatment and as associated image-monitoring appliance
Voltage generating system and memory device using the same
Self assembly of elements for displays
Method of treating cancer using a survivin inhibitor
Image scanner and image forming apparatus
  Randomly Featured Patents
Slack adjuster assembly
Production of self-supporting ceramic materials having a reduced thickness and containing metal oxides
Gas-liquid contacting apparatus
Speech recognition performance improvement method and speech recognition device
Medium for electrophoresis
Toothpaste dispenser
Valve arrangement
Door frame shield
Apparatus for measuring the duration of single optical radiation pulses