Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method for planarization of wafer and method for formation of isolation structure in top metal layer










Image Number 12 for United States Patent #8058175.

The invention discloses a planarization method for a wafer having a surface layer with a recess, comprises: forming an etching-resist layer on the surface layer to fill the entire recess; etching the etching-resist layer and the surface layer, till the surface layer outside the recess is flush to or lower than the bottom of the recess, the etching speed of the surface layer being higher than that of the etching-resist layer; removing the etching-resist layer; and etching the surface layer to a predetermined depth. The method can avoid concentric ring recesses on the surface of the wafer resulted from a chemical mechanical polishing (CMP) process in the prior art, and can be used to obtain a wafer surface suitable for optical applications.








 
 
  Recently Added Patents
Uplink interference mitigation method and apparatus
Apparatus and method for efficient transmission of acknowledgements
Pixel structure of a solid-state image sensor employing a charge sorting method
Method and system for filtering noises in an image scanned by charged particles
Cryptographic key split combiner
Validating the configuration of distributed systems
Image sensor pixels with junction gate photodiodes
  Randomly Featured Patents
Semiconductor device manufacturing method and method for reducing microroughness of semiconductor surface
Variable view imaging system with combination of telecentric scanner and double wedge prisms
Image pickup device and image pickup optical system
Laser anemometry with improved eye safety
Closed system for testing the condition of well bore formations
Apparatus and method to measure and monitor the coating of objects
Valve operating system for internal combustion engine
Composition and process for stabilizing of biomolecules
Paper processing apparatus
In-bed book stand