Resources Contact Us Home
Plasma processing apparatus

Image Number 13 for United States Patent #8038836.

A plasma processing apparatus includes a barrier wall member disposed between a plasma generation chamber and a processing chamber to separate the plasma generation chamber from the processing chamber. The barrier wall member assumes a fin structure achieved by disposing in a radial pattern numerous plate-like fin members extending from a central area thereof toward a peripheral edge. An upper end portion of each fin member overlaps a lower end portion of an adjacent fin member. The fin members are disposed with gaps formed between them and are made to range upward with a tilt along the circumferential direction.

  Recently Added Patents
Method and apparatus for allocating erasure coded data to disk storage
Personalized location information for mobile devices
Printed circuit board including electromagnetic bandgap structure
Dual-box location aware and dual-bitmap voltage domain aware on-chip variation techniques
Head shield
Fluid conduit with PTC fabric heating
Discharge circuit and method
  Randomly Featured Patents
Method and apparatus for computing a change plan using genetic programming and parse tree
Local cooling hole pattern
Cap having stiffeners
Printer paper bin
Seal, in particular electromagnetic seal
Self-releasing curing bladder
Piezoelectric component and method for the manufacture thereof
Device for simultaneous modulation and amplification of low frequency sounds
Method for low temperature ashing in a plasma
Driving circuit