Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Plasma processing apparatus and method for venting the same to atmosphere










Image Number 9 for United States Patent #8029874.

In a plasma processing apparatus provided with control means, gas supply means includes a first gas supply path for supplying a vent gas into a processing chamber by way of a shower plate and a second gas supply path for supplying a vent gas into the processing chamber without via the shower plate, and the control means is capable of adjusting a flow rate of the vent gas of at least one of the first and second gas supply paths in such a manner that a pressure on a back side of the shower plate becomes a pressure that is a positive pressure relative to a pressure in the processing chamber and less than a withstand pressure of the shower plate.








 
 
  Recently Added Patents
Spray drying vancomycin
Electrode composition with enhanced performance characteristics
Semiconductor device
Nozzle
Video stabilization
Random access for wireless multiple-access communication systems
Method for producing lactamates by way of thin film evaporation
  Randomly Featured Patents
Method of examining the states of alignment of glass fibers of a pair of ribbon fiber cables
Resonator having optical feedback coupling
Coin discriminating apparatus
Curved spring structure with downturned tip
Driving method for electrophoretic display
Ink, recording method, recording unit, ink cartridge, and recording apparatus
Reception in dedicated service of wireless communication system
Auto-escrowable and auto-certifiable cryptosystems with fast key generation
Tube and tube-plate assembly
Head frame boring method and apparatus