Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Plasma processing apparatus and method for venting the same to atmosphere










Image Number 8 for United States Patent #8029874.

In a plasma processing apparatus provided with control means, gas supply means includes a first gas supply path for supplying a vent gas into a processing chamber by way of a shower plate and a second gas supply path for supplying a vent gas into the processing chamber without via the shower plate, and the control means is capable of adjusting a flow rate of the vent gas of at least one of the first and second gas supply paths in such a manner that a pressure on a back side of the shower plate becomes a pressure that is a positive pressure relative to a pressure in the processing chamber and less than a withstand pressure of the shower plate.








 
 
  Recently Added Patents
Method to quantify siRNAs, miRNAs and polymorphic miRNAs
Data converter with configurable functions
Receiver and transmitter receiver system
Method for the synthesis of an array of metal nanowire capable of supporting localized plasmon resonances and photonic device comprising said array
Spark plug
Polymeric structures comprising a siloxane
Aisle barrier
  Randomly Featured Patents
Rotor of disc construction for single-shaft gas turbine
Bottle with gripping support
Fetal genes
Nonporous liquid impermeable cryogenic barrier
Chair
System and method for authoring an expert system
Image reading apparatus and image reading method
Filing cabinet with pivotal drawer
Baby seat for a grocery cart
Method for controlling output power of an energy storage device in a powertrain system