Resources Contact Us Home
Pixel structure and method for manufacturing the same

Image Number 4 for United States Patent #7998803.

A method for manufacturing a pixel structure is provided. First, a first mask process is performed to form a patterned first metal layer on a substrate, wherein the patterned first metal layer includes a gate. Next, a second mask process is performed to form a patterned insulating layer and a patterned semiconductor layer over the gate, wherein the patterned insulating layer is disposed on the patterned first metal layer, and the patterned semiconductor layer is disposed on the patterned insulating layer. Then, a third mask process is performed to define a thin film transistor (TFT) and a pixel electrode connected thereto and to form a passivation layer to cover the TFT.

  Recently Added Patents
Synthesizing VHDL multiple wait FSMS into RT level FSMS by preprocessing
3D IC method and device
Process for producing a carbon-comprising support
Adaptive non-positive inductor current detector (ANPICD)
Disk drive to enable defect margining
Animation control apparatus, animation control method, and non-transitory computer readable recording medium
Computer product, information retrieval method, and information retrieval apparatus
  Randomly Featured Patents
Device for adjusting the flexibility of a ski boot or the like article
Load balanced planar bearing assembly especially for a cryogenic probe station
Shaped article of synthetic resin having improved surface
Portable belt sander
System and method for WLAN signal strength determination
Focusing servo controlling apparatus
Liquid substituted 2H-benzotriazole mixtures, stabilized compositions
Optical sheet having at least, a pattern layer and a core layer composed of light-permeable thermoplastic resins, and manufacturing method thereof
Drum-shaped container for a laundry washing or drying machine
Hypermedia link marker abstract and search services