Resources Contact Us Home
Semiconductor device and method of fabricating the same

Image Number 3 for United States Patent #7993992.

There is disclosed a method of fabricating TFTs having reduced interconnect resistance by having improved contacts to source/drain regions. A silicide layer is formed in intimate contact with the source/drain regions. The remaining metallization layer is selectively etched to form a contact pad or conductive interconnects.

  Recently Added Patents
Shot scent dispenser
Systems and methods for providing a shared folder via television
Systems and methods for synchronizing and controlling multiple image sensors
Light barrier and method for detecting objects
Circuit and method for generating an AC voltage from a plurality of voltage sources having a temporally variable DC output voltage
Redistribution layer (RDL) with variable offset bumps
Optical fixing device and image forming apparatus
  Randomly Featured Patents
Ear thermometer
Jack for telephone set
Method and apparatus for generating a display based on logical groupings of network entities
Satellite communication system having double-layered earth orbit satellite constellation with two different altitudes
Method and apparatus for measuring scattering property and absorption property in scattering medium
Metallic core of rubber crawler
Wheel and axle assembly
Warning module on rear approaching cars
Torque wrenches
Pet shelter