Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Methods of forming insulation layer patterns and methods of manufacturing semiconductor devices including insulation layer patterns










Image Number 5 for United States Patent #7989335.

In a method of forming an insulation layer pattern, an insulation layer is formed on a substrate. An organic layer and a hard mask layer are successively formed on the insulation layer. A preliminary hard mask pattern having first openings is formed by patterning the hard mask layer. A hard mask pattern having the first openings and second openings is formed by patterning the preliminary hard mask pattern. Width control spacers are formed on sidewalls of the first and the second openings. An etching mask pattern is formed by etching the organic layer using the hard mask pattern as an etching mask. The insulation layer pattern having third openings is formed by etching the insulation layer using the etching mask pattern as an etching mask.








 
 
  Recently Added Patents
Side portion of a circular saw blade
Soybean cultivar CL0911610
System and method for data reconfiguration in an optical communication network
White polyester film and surface light source therewith
Carbonyl-ene functionalized polyolefins
Multi-radio coexistence
System and method for reducing antivirus false positives
  Randomly Featured Patents
Coffeemaker
Image processing apparatus, image processing method, and computer-readable recording medium
Guanidine derivatives, their production and insecticides
Process of forming a deflection mirror in a light waveguide
Apparatus for stimulating living tissue
PLL for clock recovery with initialization sequence
Continuous vessel deflection monitor device
Installation for the atuomatic reading of informations on moved objects
Photoacoustic indicators
Multi-rank memory module that emulates a memory module having a different number of ranks