Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Imaging device
Dynamic web page construction based on determination of client device location
Inflatable workshop
System and method for multi-threaded MIMO OFDM channel equalizer
Gas cap removal tool
Blueberry plant named `DrisBlueFour`
Automated macular pathology diagnosis in three-dimensional (3D) spectral domain optical coherence tomography (SD-OCT) images
  Randomly Featured Patents
Control apparatus for hydraulically operated vehicular transmission
Amplifier for amplification of a microactuator
Partitioning system
Multiple speed fast forward/rewind compressed video delivery system
Vertical cavity surface-emitting laser with optical guide and current aperture
Shielded connector having modular construction
Surgical fastener-applying apparatuses with sequential firing
Display system
Pyrazolo[3,4-b]pyridine compounds, and their use as PDE4 inhibitors
Parametric measuring circuit for minimizing oscillation effect