Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Reducing contours in digital images
Handheld metallic debris collector
Systems and methods for tracking and providing workflow information
Torque wrench system having multiple torque stations
Apparatus and method for controlling transmission power in a wireless communication system using fractional frequency reuse
Providing base station almanac to mobile station
Method and system for connecting a telephone call to a third party
  Randomly Featured Patents
Miniature shredding tool for use in medical applications and methods for making
Method for the preparation of an aldehyde
Circuit and method for regulating discharge of a capacitor
Door hold-open mechanism
Restriction of fluid ejector membrane
Method for positioning a tool
System for handling curved form media and cassette therefor
Automatic reset circuit
Method for producing anellated triazoles and new anellated triazoles and their use
Information processing apparatus and display control method