Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Methods and apparatus to identify exposure to 3D media presentations
Liposomes with improved drug retention for treatment of cancer
Analogue-to-digital converter
Packet communication system and packet communication method, and node and user device
Reliability fire pressure switch
Wireless communication power control
Chromene compound
  Randomly Featured Patents
Peptidic compounds selectively binding to P-selectin
Method for producing spallation-resistant protective layer on high performance alloys
Remove power source device having improved capacity indication capability, and an electronic device using the removable power source device
Flower pot cover
Polymeric acid catalysts and uses thereof
Semiconductor memory device
Image display apparatus having three-dimensionally decentered optical path
Duct for cables
Optical modulators