Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Rewriting branch instructions using branch stubs
Bacterial superantigen vaccines
Myoglobin blooming agents, films, packages and methods for packaging
Display sheet, display device, and electronic apparatus
Mixed reactant flow-by fuel cell
Method and system for blocking hazardous information
Mobile terminal
  Randomly Featured Patents
Display apparatus
Retractable printing/coating unit operable on the plate and blanket cylinders simultaneously from the dampener side of the first printing unit or any consecutive printing unit of any rotary of
Hydrotreating catalyst composition and processes therefor and therewith
Weighted stick practice aid
Semiconductor device having address transition detecting circuit
Method of conserving waterlogged materials
Controlling access to services via usage models
Liquid crystal display with reduced black level insertion
Telephone base with combinative keyboard, display panel, speakerphone, and handset therefor
Waveguide/planar line converter and high frequency circuit arrangement