Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Method for fabricating solar cell
Wound dressing with a discontinuous contact layer surface
Method for generating multi-antenna signals
Method for parking or exiting a parking bay and for avoiding a collision of a vehicle, and corresponding assistance systems and vehicle
TRPM8 antagonists and their use in treatments
Portable reading device with mode processing
Statistical information collection from one or more device(s) in storage communication with a computing platform
  Randomly Featured Patents
Diaphragm pump apparatus
Light-emitting device
Dual hysteresis method of generating square waves from non-uniform cyclical signals
Apparatus for comminuting concretions in the body of a patient
Process for the preparation of chiral imidazolinone herbicides
Ultrasonic transducer for brush detoning assist
Switched capacitor circuit and pipeline A/D converter
System for producing bituminous paving mixtures
Elemental silicon nanoparticle plating and method for the same
Candy configuration