Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Authentication for social networking messages
Image forming apparatus acquiring image processing time detected when the acquired time is longer that the previously set time and to correct output image density using generated patch pattern
Probiotic enriched and low organic acid food products
High dynamic range pixel structure
Controlling transmission resources in mobile radio systems with dualtransfer mode
Data processing method
Weighted determination in configuration management systems
  Randomly Featured Patents
Distorting shaped balloon
Power demand limiting system
Local emergency isolation valve controller with diagnostic testing and trouble indicator
Disposable diaper
Aminopyridine derivatives having Aurora A selective inhibitory action
Process for removal of pitch-containing water and method of coating belts for paper machine
Compact disc stand
Gene treatment to enhance feed efficiency and growth rate of livestock
Forged piston for internal combustion engine and manufacturing method thereof
Electroless epitaxial etching for semiconductor applications