Resources Contact Us Home
Semiconductor oxidation apparatus and method of producing semiconductor element

Image Number 10 for United States Patent #7981700.

A semiconductor oxidation apparatus is provided with a sealable oxidation chamber defined by walls, a base provided within the oxidation chamber and configured to support a semiconductor sample, a supply part configured to supply water vapor into the oxidation chamber to oxidize a specific portion of the semiconductor sample, a monitoring window provided in one of the walls of the oxidation chamber and disposed at a position capable of confronting the semiconductor sample supported on the base, a monitoring part provided outside the oxidation chamber and capable of confronting the semiconductor sample supported on the base via the monitoring window, and an adjusting part configured to adjust a distance between the base and the monitoring part.

  Recently Added Patents
Permanent magnet rotor with flux concentrating pole pieces
Interference suppressing OFDM system for wireless communications
Actuators and moveable elements with position sensing
Powerline communication device with load characterization functionality
Method for generating multi-antenna signals
Etching apparatus and methods
  Randomly Featured Patents
Automobile wheel
Reflective linear encoder having controlled detector to code strip distance
Belt shortening device
Modular footwear display and storage system and method
Ultrasound catheter having protective feature against breakage
Implant device for the surgical treatment of infertility due to obstruction of uterine tubes
Sensor chips
High-color-temperature tandem white OLED
Devices and methods for promoting or enhancing male erectile function
Lanthanide dielectric with controlled interfaces