Resources Contact Us Home
Multi-port pumping system for substrate processing chambers

Image Number 5 for United States Patent #7964040.

An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.

  Recently Added Patents
Exposure apparatus, exposure method, and device manufacturing method
Processing color and panchromatic pixels
Collaborative data redundancy for configuration tracking systems
Implant for performance enhancement of selected transistors in an integrated circuit
Method and system for facilitating micropayments in a financial transaction system
Processing circuitry for use with a position sensor
Press nut
  Randomly Featured Patents
Liquid-solid propulsion system and method
Radio communication system, and gateways, radio intelligent terminals and radio communication methods applied thereto
Method and apparatus for improving wireless data networks performance
Air conditioner and antibacterial case
Method of providing dialtone first on step by step telephone systems
Spiraled self-piercing rivet
Portable pitching mound base
Process for the purification of industrial waste-waters
Method for half tone phase matching at run boundaries
Dual-mode fiber optic telecommunications system and method