Resources Contact Us Home
Multi-port pumping system for substrate processing chambers

Image Number 5 for United States Patent #7964040.

An exhaust foreline for purging fluids from a semiconductor fabrication chamber is described. The foreline may include a first, second and third ports independently coupled to the chamber. A semiconductor fabrication system is also described that includes a substrate chamber that has a first, second and third interface port. The system may also include a multi-port foreline that has a first, second and third port, where the first foreline port is coupled to the first interface port, the second foreline port is coupled to the second interface port, and the third foreline port is coupled to the third interface port. The system may further include an exhaust vacuum coupled to the multi-port foreline.

  Recently Added Patents
Restore software with aggregated view of content databases
Flat panel display
Electronic multiparty accounts receivable and accounts payable system
Liquid crystal display
Analog-to-digital converter with input voltage biasing DC level of resonant oscillator
Feedback method and processing system for policy installation failures
Machine shop including computer system that interfaces with different legacy servers
  Randomly Featured Patents
Method of displaying object and terminal capable of implementing the same
Paper sheet running-out mechanism
Dynamic information source management
Apparatus and methods for voice titles
Skateboard hubcap retrofit assembly
Binder with closure
Nonaqueous electrolyte comprising oxyanion and lithium secondary battery using the same
Multi-deflection CRT display
Faceshield attachment
Motor control device