Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Post-CMP treating liquid and manufacturing method of semiconductor device using the same










Image Number 2 for United States Patent #7951717.

Post-CMP treating liquids are provided, one of which includes water, an amphoteric surfactant, an anionic surfactant, a complexing agent, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Another includes water, polyphenol, an anionic surfactant, ethylene diamine tetraacetic acid, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Both of the treating liquids have a pH ranging from 4 to 9, and exhibit a polishing rate both of an insulating film and a conductive film at a rate of 10 nm/min or less.








 
 
  Recently Added Patents
High electron mobility transistor and manufacturing method thereof
Purine compounds used as CB2 agonists
Portable computer
Toy ball
Managing a packet service call within mobile communications user equipment
Method and apparatus for disease diagnosis and screening using extremely low frequency electromagnetic fields
Hand-held optical probe based imaging system with 3D tracking facilities
  Randomly Featured Patents
Turbo coding for upstream and downstream transmission in cable systems
Air-cooled heat exchanger for electronic circuit modules
Image stabilizing apparatus
Diffuser for a motor fan assembly
Vibration wave driven motor
Liquid crystal devices
Method and apparatus for framing of objects
Semiconductor devices and methods of fabricating the same
System and method for refueling a hydrogen vessel
Hoop stent