Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Post-CMP treating liquid and manufacturing method of semiconductor device using the same










Image Number 2 for United States Patent #7951717.

Post-CMP treating liquids are provided, one of which includes water, an amphoteric surfactant, an anionic surfactant, a complexing agent, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Another includes water, polyphenol, an anionic surfactant, ethylene diamine tetraacetic acid, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Both of the treating liquids have a pH ranging from 4 to 9, and exhibit a polishing rate both of an insulating film and a conductive film at a rate of 10 nm/min or less.








 
 
  Recently Added Patents
Method for dropping packet data, radio communication device, and mobile communication system
Data security for dynamic random access memory using body bias to clear data at power-up
Porous polymeric resins
Advocate for facilitating verification for the online presence of an entity
Estimating optical characteristics of a camera component using sharpness sweep data
Auto-aligning spectroscopy system
Attribute category enhanced search
  Randomly Featured Patents
Compositions and methods for inhibiting expression of an RNA from West Nile virus
Spray data acquisition system
Automated food mixer cleaning system
Method and system of driving a CCFL
Cart
Business logic server for facilitating the transmission of a data download to a mobile wireless unit
Low complexity error correction using cyclic redundancy check (CRC)
Conductive fire-retardant thermoplastic elastomer mixture
Process for preparing a benzoylbenzeneacetamide derivative
Digital audio file search method and apparatus using text-to-speech processing