Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Post-CMP treating liquid and manufacturing method of semiconductor device using the same










Image Number 2 for United States Patent #7951717.

Post-CMP treating liquids are provided, one of which includes water, an amphoteric surfactant, an anionic surfactant, a complexing agent, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Another includes water, polyphenol, an anionic surfactant, ethylene diamine tetraacetic acid, resin particles having carboxylic group and sulfonyl group on their surfaces, a primary particle diameter thereof ranging from 10 to 60 nm, and tetramethyl ammonium hydroxide. Both of the treating liquids have a pH ranging from 4 to 9, and exhibit a polishing rate both of an insulating film and a conductive film at a rate of 10 nm/min or less.








 
 
  Recently Added Patents
Means to securely fixate pacing leads and/or sensors in vessels
Use of natural query events to improve online advertising campaigns
Contact sensor, driver device, and care bed
Method for encoding signal, and method for decoding signal
Multifunction switch for vehicle having lighting module
Fabrication of high gradient insulators by stack compression
System, method, and computer program product for identifying unwanted data communicated via a session initiation protocol
  Randomly Featured Patents
Crop baler belt system
Handbag
Integrated cross-wire fixture for coating a device, a method of using the fixture, and a device made using the fixture
Sandalwood odorants
Rear wheel steering apparatus for an automobile
Scroll wheel assembly using a unidirectional locking system
Process for producing alcohols
Reheat type exhaust gas boiler
Multiple end effectors ultrasonic surgical instruments
Shared rate limiters using floating buckets