Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Chemical mechanical planarization pad










Image Number 3 for United States Patent #7931713.

A Chemical Mechanical Planarization (CMP) Pad. The CMP pad may be hydrophobic due to the incorporation of metal complexing agents. The CMP pad substantially retaining planarization characteristics throughout planarization applications. Shearing, hardness, wearing, water absorption and electrical characteristics of the CMP pad remain substantially constant during CMP applications.








 
 
  Recently Added Patents
System and method for customized prompting
Invisible fence battery charger
Light emitting device and light emitting device package
Voltage generating system and memory device using the same
Image processing unit, image processing method and program
Di and tri- substituted oxathiazine derivatives, method for the production, method for the production thereof, use thereof as medicine and drug containing said derivatives and use thereof
Estimating optical characteristics of a camera component using sharpness sweep data
  Randomly Featured Patents
Heating element for thermal heating devices, especially cooking stations
Container body portion
Method and apparatus for isochronous data transfer with retry capability
System and method for handling permits for user authentication tokens
Band having spaced bullet cartridge elements
Method for operating a flowmeter
Method for manufacturing insulating troughs for pipes, and an apparatus for carrying out the method
Mosquito trapping device
Rectangular eyeglass lens with semi-shape aperture
Compositions and methods for treatment of neoplastic disease