Resources Contact Us Home
Method for forming low dielectric constant fluorine-doped layers

Image Number 13 for United States Patent #7910475.

A method for forming a semiconductor device is provided. In one embodiment, the method includes providing a semiconductor substrate with a surface region. The surface region includes one or more layers overlying the semiconductor substrate. In addition, the method includes depositing a dielectric layer overlying the surface region. The dielectric layer is formed by a CVD process. Furthermore, the method includes forming a diffusion barrier layer overlying the dielectric layer. In addition, the method includes forming a conductive layer overlying the diffusion barrier layer. Additionally, the method includes reducing the thickness of the conductive layer using a chemical-mechanical polishing process. The CVD process utilizes fluorine as a reactant to form the dielectric layer. In addition, the dielectric layer is associated with a dielectric constant equal or less than 3.3.

  Recently Added Patents
Method of controlling an indentation depth of an electrode into a metal substrate during welding
Active constant power supply apparatus
Compositions and methods of vascular injury repair
Audio processing in a multi-participant conference
High purity diphenyl sulfone, preparation and use thereof for the preparation of a poly(aryletherketone)
Semiconductor memory device, method of controlling read preamble signal thereof, and data transmission method
Rotation angle detecting device
  Randomly Featured Patents
Pivotable hairbrush
Static shielding sheet materials and bags formed therefrom
Firefighter's trousers capable of receiving a booted foot
Autonomous oceanographic profiler
Fully-buffered dual in-line memory module with fault correction
Solar cell case of a pavement marker
Torsional vibration damper with axially toothed gear elements
Laminate and gasket manifold for ink jet delivery systems and similar devices
Reprogrammable nonvolatile memory devices and methods
Diversity receiver and diversity receiving method