Resources Contact Us Home
Semiconductor device and method of manufacturing the same

Image Number 15 for United States Patent #7883983.

A method of manufacturing a semiconductor device, includes: forming a gate insulating film on a semiconductor substrate; forming a first metal film on the gate insulating film; forming a second metal film on the first metal film; and patterning a stacked film of the first and second metal films such that the stacked film is left in a gate electrode formation region and a resistive element formation region. The method further includes: removing the second metal film in the resistive element formation region with protecting a contact hole formation region. The method further includes: forming an interlayer insulating film so as to cover the stacked film; and removing the interlayer insulating film formed in the contact hole formation region to form a contact hole leading to the second metal film.

  Recently Added Patents
Antibodies to Clostridium difficile toxins
Varying latency timers in a wireless communication system
System, apparatus and method for enabling/disabling display data channel access to enable/disable high-bandwidth digital content protection
Memory with separate read and write paths
Apparatus and methods for inventory, sale, and delivery of digitally transferable goods
Methods for predicting cardiac toxicity
Methods and kits for predicting the responsiveness of hepatocellular carcinoma patients to 5-fluorouracil-based combination chemotherapy
  Randomly Featured Patents
External rearview mirror for automobiles
Production of oriented material or composite material through centrifugal burning
Spiral-type ductor
Seat striker mechanism
Method and system for leasing of network services and applications based on a usage pattern
Microshell gas discharge device
Gelato container
Brush with wave-shaped bristles
Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition
Rotary rock windrower