Resources Contact Us Home
Semiconductor device and method of manufacturing the same

Image Number 15 for United States Patent #7883983.

A method of manufacturing a semiconductor device, includes: forming a gate insulating film on a semiconductor substrate; forming a first metal film on the gate insulating film; forming a second metal film on the first metal film; and patterning a stacked film of the first and second metal films such that the stacked film is left in a gate electrode formation region and a resistive element formation region. The method further includes: removing the second metal film in the resistive element formation region with protecting a contact hole formation region. The method further includes: forming an interlayer insulating film so as to cover the stacked film; and removing the interlayer insulating film formed in the contact hole formation region to form a contact hole leading to the second metal film.

  Recently Added Patents
Circuit board and display panel assembly having the same
Regenerative power storage system mounted on DC electric railway car
Transfer device and image forming apparatus including regulation member
Electronic device package and fabrication method thereof
Methods and compositions for inhibiting progression to chronic cardiac failure
Dynamic allocation of access channels based on access channel occupancy in a cellular wireless communication system
Method of forming an isolation structure
  Randomly Featured Patents
Variable gain low-pass filter
Device for supporting brake shoes of a drum brake
Thumb conformable suction control regulator
Maleated high acid number high molecular weight polypropylene of low color
Apparatus and method for generating partially coherent illumination for photolithography
Articulating suspension system for a bridge of an overhead bridge crane
Method and apparatus of testing memory device power and ground pins in an array assembly platform
Method of making a honeycomb product
System for providing in-situ temperature monitoring and temperature control of a specimen being exposed to plasma environments
Automatically generating precipitation proximity notifications