Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Semiconductor device and method of manufacturing the same










Image Number 14 for United States Patent #7883983.

A method of manufacturing a semiconductor device, includes: forming a gate insulating film on a semiconductor substrate; forming a first metal film on the gate insulating film; forming a second metal film on the first metal film; and patterning a stacked film of the first and second metal films such that the stacked film is left in a gate electrode formation region and a resistive element formation region. The method further includes: removing the second metal film in the resistive element formation region with protecting a contact hole formation region. The method further includes: forming an interlayer insulating film so as to cover the stacked film; and removing the interlayer insulating film formed in the contact hole formation region to form a contact hole leading to the second metal film.








 
 
  Recently Added Patents
Simultaneous wafer bonding and interconnect joining
Image forming apparatus, information processing method, and storage medium for generating screen information
Structure of circuit board and method for fabricating the same
Radio frequency splitter
Self-assembling surface coating
Enterprise seamless mobility
Process of preparing functionalized polymers via enzymatic catalysis
  Randomly Featured Patents
Publicly accessible video teleconferencing kiosk
Insert for windshield assembly
Valve structure for consistent valve operation of a miniaturized fluid delivery and analysis system
Symbol timing recovery network for a carrierless amplitude phase (CAP) signal
Semiconductor integrated circuit
Detection of a change of the data of a dataset
Shoe lace cover
Display screen with an icon
Recovery of rhodium from carbonylation residues
Method and system for providing agent training