Resources Contact Us Home
Plasma processing method and plasma processing apparatus

Image Number 6 for United States Patent #7858155.

It is intended to provide a plasma processing method and apparatus capable of increasing the uniformity of amorphyzation processing.A prescribed gas is introduced into a vacuum container 1 from a gas supply apparatus 2 through a gas inlet 11 while being exhausted by a turbomolecular pump 3 as an exhaust apparatus through an exhaust hole 12. The pressure in the vacuum container 1 is kept at a prescribed value by a pressure regulating valve 4. High-frequency electric power of 13.56 MHz is supplied from a high-frequency power source 5 to a coil 8 disposed close to a dielectric window 7 which is opposed to a sample electrode 6, whereby induction-coupled plasma is generated in the vacuum container 1. A high-frequency power source 10 for supplying high-frequency electric power to the sample electrode 6 is provided and functions as a voltage source for controlling the potential of the sample electrode 6. A surface crystal layer of a silicon wafer 9 was rendered amorphous successfully by improving the structure of the sample-electrode 6.

  Recently Added Patents
Enediyne compounds, conjugates thereof, and uses and methods therefor
Collaborative image capture
Systems and methods for dynamically modifying subcriber service profile stored in home location register while roaming in wireless telecommunication networks
Touch panel structure and manufacturing method thereof
Leadless integrated circuit packaging system and method of manufacture thereof
Method to quantify siRNAs, miRNAs and polymorphic miRNAs
Digital broadcast receiver and method for processing caption thereof
  Randomly Featured Patents
Apparatus for manufacturing expandable polystyrene (EPS) pellets
System and method for application security assessment
Electronic video camera with recording and reproducing functions
Specimen test unit
Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
Stress-optical phase modulator and modulation system and method of use
Data input device
Print head with reduced bonding stress and method
Fast-detaching electrically insulated implant
Method of growing single crystal of compound semiconductor