Resources Contact Us Home
Substrate processing apparatus

Image Number 6 for United States Patent #7854821.

A substrate processing apparatus includes a heat transfer gas supply mechanism to supply a heat transfer gas through a supply passage into a portion between a worktable and a substrate to improve thermal conductivity between therebetween. Under the control of a control section, the pressure inside the supply passage is measured to obtain a pressure measurement value while the substrate is placed on the worktable. Then, a preparatory flow rate of the heat transfer gas to be supplied through the supply passage into the portion between the worktable and substrate is determined, in accordance with the pressure difference between the pressure measurement value and a pressure reference value, prior to a main process to be performed on the substrate. Then, the heat transfer gas is supplied through the supply passage into the portion between the worktable and substrate at the preparatory flow rate, prior to the main process.

  Recently Added Patents
Flood protection apparatus and container data center including the same
Antenna device
Monitoring device, monitoring method and non-transitory computer readable medium
Field-programmable analog array with memristors
Image forming apparatus
Module-code verification layer to automatically validate user input
Power-saving receiver
  Randomly Featured Patents
Image processing system for preventing forgery
Solid-electrolyte fuel cell
Retaining a part within a business form
Pest resistant MoSi2-based materials containing in-situ grown .beta.-Si3N4 whiskers
Electrical connector with spring biased contacts
Endovascular catheter air block
Gas refining system
Semiconductor device having multi-layer electrode wiring
Hydraulic time delay valve
IAP inhibitors