Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of forming a contact hole and method of manufacturing a semiconductor device having the same










Image Number 12 for United States Patent #7846825.

In a method of forming a contact hole and a method of manufacturing a semiconductor device having the same, a first insulation interlayer is formed on a substrate. A dummy pattern is formed on the first insulation interlayer. A second insulation interlayer is formed to cover the dummy pattern. A photoresist pattern is formed on the second insulation interlayer. The photoresist pattern has an exposed portion. The dummy pattern under the photoresist pattern is arranged to cross over the exposed portion of the photoresist pattern. The first and second insulation interlayers are etched using the photoresist pattern and the dummy pattern as an etching mask, to form a plurality of contact holes on both sides of the dummy pattern. Accordingly, the contact holes may be formed to have a smaller width.








 
 
  Recently Added Patents
Feedback method and processing system for policy installation failures
Processor engine, integrated circuit and method therefor
Prodrugs of [4 [4-(5-Aminomethyl-2-fluoro-phenyl)-piperidin-1-yl]-(1H-pyrrolo-pyridin-yl- )-methanones and synthesis thereof
Clock face
Placental tissue grafts
Method and system for modifying satellite radio program subscriptions in a mobile vehicle
Methods and system for providing drug pricing information from multiple pharmacy benefit managers (PBMs)
  Randomly Featured Patents
Hook for supporting shower curtain and shower curtain liner
High-frequency module coupled via aperture in a ground plane
Web section, round sling made from the web section, and method of making the round sling
Step-down voltage output circuit
Method for seamless inter-frequency hard handover in radio communication system
Tailgate prevention and warning light
Antagonists of gonadotropin releasing hormone
Push button assembly
Combined bottle and cap
Fixed pattern noise subtraction in a digital image sensor