Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium










Image Number 6 for United States Patent #7837804.

In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.








 
 
  Recently Added Patents
Computer system and volume migration control method using the same
Battery loading and unloading mechanism
Image processor
Piano keyboard with key touch point detection
Contactless electrical connector for an induction sensor, and sensor including such a connector
Apparatus and methods for providing efficient space-time structures for preambles, pilots and data for multi-input, multi-output communications systems
Interconnecting virtual domains
  Randomly Featured Patents
Process to enhance safety of cast explosive composite
Accelerated light fastness test method
Disc playing system with continuous playing function
Luminaire, in particular recessed luminaire
Using video image analysis to automatically transmit gestures over a network in a chat or instant messaging session
Ocular hypotensive agents
NMDA antagonists
Method and apparatus of verifying accurate writing through comparisons of written and read data
Array antenna controller
Rolling train for rolling flat steel