Resources Contact Us Home
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium

Image Number 6 for United States Patent #7837804.

In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

  Recently Added Patents
Developing device
RFID device using single antenna for multiple resonant frequency ranges
High brightness laser diode module
Optical recording medium, and method for producing optical recording medium
Battery cell separator
Carrying case
Visibility radio cap and network
  Randomly Featured Patents
Optical transducer having optical fiber plug transparent to curing light and non-transparent to sensing light
Method and system of online shopping via third party using blog
Coated article having low-E coating with ion beam treated IR reflecting layer and corresponding method
Industrial robot for welding and cutting by means of a laser beam
Substituted 5,6,6a, 11b-tetrahydro-7-oxa-5-aza-benzo[c]fluorene-6-carboxylic acid compounds as NMDA-antagonists
Hydraulic controller for a continuously variable transmission
Octagonal bulk bin
Ultrasound imaging system employing phase inversion subtraction to enhance the image
Direct positive silver halide emulsion
Inbred maize line PHB18