Resources Contact Us Home
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium

Image Number 6 for United States Patent #7837804.

In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

  Recently Added Patents
Lateral double diffused metal oxide semiconductor device and method of manufacturing the same
Method for generating codewords
System for setting programmable parameters for an implantable hypertension treatment device
System, method, and computer readable medium for a force-based wheelchair joystick
Printing apparatus and method of operation of a printing apparatus
Electronic dispersion compensation within optical communications using reconstruction
  Randomly Featured Patents
Manufacturing process of a split gate flash memory unit
Fabricating process and structure of thermal enhanced substrate
Naphthyridine-3-carboxamido-benzylpenicillins and salts thereof
Test system for measurements of insulation resistance
Battery charger
Embossed laminated board
Hardware assembly for luggage and the like
Adjustable garage door opener mount
Method and apparatus for conformal radiation therapy