Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium










Image Number 6 for United States Patent #7837804.

In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.








 
 
  Recently Added Patents
Poly(phenylene ether) composition and article
Apparatus and method for top removal of granular material from a fluidized bed deposition reactor
Writing instrument
Rear combination lamp for automobile
Electronic device and method of controlling the same
Phalaenopsis plant named `SUPHAL1203`
Image forming apparatus using a toner container in which the toner outlet may be positioned in a horizontal or vertical direction
  Randomly Featured Patents
Dithering mechanism for a high resolution imaging system
Fish gripper
Method, apparatus, and system for synchronously resetting logic circuits
Microelectromechanical system
Perfumes
Image reading unit and image reading apparatus having the same
Semiconductor integrated circuit for brushless motor drive control and brushless motor drive control apparatus
I2C bus switching devices interspersed between I2C devices
Hand actuated soil displacement and planting device
Optical gate based optical space division switch