Resources Contact Us Home
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium

Image Number 6 for United States Patent #7837804.

In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

  Recently Added Patents
Configuration method and system of complex network and configuration and management module of server resources
Utilizing virtually stored media snapshots for rasterizing print jobs
Emergency power-off button with proximity alarm
Display panel and gate driving circuit and driving method for gate driving circuit
Mobile camera localization using depth maps
Low latency interrupt collector
Aircraft drive
  Randomly Featured Patents
Method of manufacturing semiconductor device
Polyaxial pedicle screw assembly
Light emitting diode and method for making the same
High performance sprag clutch assembly
Ski construction
Method and apparatus for controlling the flow rate and aiming when pouring molten material from a container
Systems and methods for improved timing recovery
Canister with paper and plastic layers and a plastic lid for containing a particulate-type product, such as a ready-to-eat cereal
Sample inlet liner
Method and apparatus for emulating a fiber channel port