Resources Contact Us Home
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium

Image Number 6 for United States Patent #7837804.

In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

  Recently Added Patents
Methods, devices and software applications for facilitating a development of a computer program
Surface emitting laser device, surface emitting laser array, optical scanning device, and image forming apparatus
Stack and folding-typed electrode assembly and method for preparation of the same
Method and system for dynamic digital rights bundling
Pointing device, display apparatus and pointing system, and location data generation method and display method using the same
Visibility radio cap and network
Tag-based apparatus and methods for neural networks
  Randomly Featured Patents
Method of driving ferroelectric gate transistor memory cell
Display device with a bracket covering
Mechanical toy robot
Method and apparatus for confinement of ions in the presence of a neutral gas
Magnetic head with magnetic substrate and an enhanced poletip thereon
Process for carbonylation of alkenes to ketones
Apparatus for producing carbon black
Heat resistant ethylene-propylene rubber and insulated conductor product thereof
Method and arrangements for an event triggered DRX cycle
Interlocking jack stand