Resources Contact Us Home
Variable volume plasma processing chamber and associated methods

Image Number 14 for United States Patent #7824519.

A plasma processing chamber includes a substrate support having a top surface defined to support a substrate in a substantially horizontal orientation within the chamber. The plasma processing chamber also includes a number of telescopic members disposed within the chamber outside a periphery of the substrate support. The number of telescopic members are also disposed in a concentric manner with regard to a center of the top surface of the substrate support. Each of the number of telescopic members is defined to be independently moved in a substantially vertical direction so as to enable adjustment of an open volume above the top surface of the substrate support, and thereby enable adjustment of a plasma condition within the open volume above the top surface of the substrate support.

  Recently Added Patents
Antagonists of the glucagon receptor
Circuit for and method of enabling communication of cryptographic data
Measurement of an analyte on the skin using a hue angle
System and method of supplying an electrical system with direct current
Ultrathin fluid-absorbent cores
Movable assemblies for an image reader unit and a cover unit in an image formation apparatus
Printing apparatus and method of operation of a printing apparatus
  Randomly Featured Patents
Polymerisable compositions using air-activated latent initiator system of hydrogenated pyridine compound and acid
Luminaire for road lighting
System, method, and devices for allocating communications-related charges
Digging tooth
Method and system for data reception acknowledgement
System and method for mobile computing device registration with a service node
Synchronous rectifier self gate drive for zero voltage switching power conversion circuits
Seatbelt device
Stunning of animals
Viscosity-stabilizing cleaning composition