Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Variable volume plasma processing chamber and associated methods










Image Number 14 for United States Patent #7824519.

A plasma processing chamber includes a substrate support having a top surface defined to support a substrate in a substantially horizontal orientation within the chamber. The plasma processing chamber also includes a number of telescopic members disposed within the chamber outside a periphery of the substrate support. The number of telescopic members are also disposed in a concentric manner with regard to a center of the top surface of the substrate support. Each of the number of telescopic members is defined to be independently moved in a substantially vertical direction so as to enable adjustment of an open volume above the top surface of the substrate support, and thereby enable adjustment of a plasma condition within the open volume above the top surface of the substrate support.








 
 
  Recently Added Patents
2,2'-binaphthalene ester chiral dopants for cholesteric liquid crystal displays
Method of and apparatus for laser drilling holes with improved taper
Container
Intrinsic absorber layer for photovoltaic cells
Compositions and processes for forming photovoltaic devices
Managing multiple web services on a single device
Nano-pigment inkjet ink composition that has a low odor and is environmentally-friendly
  Randomly Featured Patents
Integrity test for porous structures using acoustic emission
Data encoding method for digital data recording and data recording system using the same
Developing apparatus and image forming apparatus that incorporates the developing apparatus
Integrated circuitry
Desktop container
Opto-electronic sensor for the measurement of linear values using adjacent emitted-detector pair and focusing and deviating means
Personal watercraft including support for lower back of leg of rider
Method and apparatus for specialized candle
Athletic brassiere
Apparatus and method for controller performance monitoring in a process control system