Resources Contact Us Home
Variable volume plasma processing chamber and associated methods

Image Number 14 for United States Patent #7824519.

A plasma processing chamber includes a substrate support having a top surface defined to support a substrate in a substantially horizontal orientation within the chamber. The plasma processing chamber also includes a number of telescopic members disposed within the chamber outside a periphery of the substrate support. The number of telescopic members are also disposed in a concentric manner with regard to a center of the top surface of the substrate support. Each of the number of telescopic members is defined to be independently moved in a substantially vertical direction so as to enable adjustment of an open volume above the top surface of the substrate support, and thereby enable adjustment of a plasma condition within the open volume above the top surface of the substrate support.

  Recently Added Patents
Switching apparatus and controlling method thereof
Method and systems for detecting duplicate travel path
Method of making a CIG target by cold spraying
Information storage medium, reproducing method, and recording method
System and method to assess and report the health of landing gear related components
Vaccination with killed but metabolically active (KBMA) protozoans with toll-like receptor agonists
Optical imaging device and imaging method for microscopy
  Randomly Featured Patents
Method for gauging a mold cavity for injection molding
Spray texture material compositions, systems, and methods with anti-corrosion characteristics
Shovel device for loading and transferring sheet of dough particularly for pizzas
Lysis method for micro-organisms
Device for variable adjustment of the control times of gas exchange valves of an internal combustion engine
Urethane foam gun
Narrow pull tab
Scheduling information sharing protocol of communication system
Rear combination lamp for automobiles
Multi-mode radio with interference cancellation circuit