Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Selective plasma processing method










Image Number 13 for United States Patent #7811945.

A selective plasma processing method, within a processing chamber of a plasma processing apparatus, acts oxygen-containing plasma on a target object having silicon and a silicon nitride layer to selectively oxidize the silicon with respect to the silicon nitride layer and to form a silicon oxide film. Further, the ratio of a thickness of a silicon oxynitride film formed within the silicon nitride layer to a thickness of the silicon oxide film formed by the oxidization is equal to or smaller than 20%.








 
 
  Recently Added Patents
Representations of compressed video
Human activity monitoring device
Interface circuit
Method for providing information of access point selection
Eyeglasses
System and method for enhanced transaction payment
Transparent zebrafish and preparation method thereof
  Randomly Featured Patents
Light emission device
Semiconductor device having lateral IGBT
Method and apparatus for rescheduling operations in a processor
Systems for synchronous multipoint-to-point orthogonal frequency division multiplexing communication
Semiconductor device with stacked semiconductor elements
Watch case
Air purifier
Access network with an integrated splitter
Method of processing seismic data signals
Device for operating an adjusting drive