Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Selective plasma processing method










Image Number 13 for United States Patent #7811945.

A selective plasma processing method, within a processing chamber of a plasma processing apparatus, acts oxygen-containing plasma on a target object having silicon and a silicon nitride layer to selectively oxidize the silicon with respect to the silicon nitride layer and to form a silicon oxide film. Further, the ratio of a thickness of a silicon oxynitride film formed within the silicon nitride layer to a thickness of the silicon oxide film formed by the oxidization is equal to or smaller than 20%.








 
 
  Recently Added Patents
Rotation angle detecting device
Preparation and use of meristematic cells belonging to the Dendrobium phalaenopsis, Ansellia, Polyrrhiza, Vanilla, Cattleya and Vanda genera with high content of phenylpropanoids, hydrosoluble
Intraoral camera for dental chairs
Etching method, etching apparatus, and computer-readable recording medium
Methods of diagnosing a plasmodium infection
Method of manufacturing crystalline silicon solar cells with improved surface passivation
Color LED display device without color separation
  Randomly Featured Patents
Applicators for health and beauty products
Optical device and method of manufacture thereof, and electronic instrument
4D anatomically based image selection procedure for medical imaging
Accurate high-flow clean regulator with input-pressure balancing
Post yard hydrant with controlled adjustable flow
Substrate-triggered bipolar junction transistor and ESD protection circuit
Apparatus and method for forming an electrical switch assembly
Non-contact transport apparatus
Reconfigurable table assemblies
Device for automatic filling of load containers