Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Selective plasma processing method










Image Number 13 for United States Patent #7811945.

A selective plasma processing method, within a processing chamber of a plasma processing apparatus, acts oxygen-containing plasma on a target object having silicon and a silicon nitride layer to selectively oxidize the silicon with respect to the silicon nitride layer and to form a silicon oxide film. Further, the ratio of a thickness of a silicon oxynitride film formed within the silicon nitride layer to a thickness of the silicon oxide film formed by the oxidization is equal to or smaller than 20%.








 
 
  Recently Added Patents
Hepatitis C virus inhibitors
Method for modeling and analyzing linear time invariant systems with time delays
Compounds for nonsense suppression and methods for their use
Composite filtration membranes and methods of preparation thereof
Control method of LPI lamp for LPI vehicle and logic therefor
Resin composition and display device using the same
Method to calibrate RF paths of an FHOP adaptive base station
  Randomly Featured Patents
Compression processing apparatus and compression processing method
Detector for microscope
Epothilone derivatives
Computer docking station with means for automatically selecting between external monitor, external keyboard, and monitor and keyboard of docked portable computer
Automatic nozzle cleaning system for ink ejection printer
Magnetic iron oxide pigments and a process for their preparation
Process for making toothbrushes
Multiple-phase combustion engine embodying hydraulic drive
Ultrasonic Doppler diagnosis apparatus
Stirrer and apparatus for small volume mixing