Image Number 4 for United States Patent #7776402.
The present invention relates to a method for pattern formation and an apparatus for pattern formation, the method comprising: applying, between partition lines for pattern formation formed on a surface of a base member, a resin composition for pattern formation having small compatibility or substantially no compatibility with a resin forming the partition lines for pattern formation, in a state in which the surface of the base member with the partition lines for pattern formation formed whereon is placed face down; maintaining the state in which the resin composition for pattern formation is held on the surface of the base member that is placed face down in order to form the resin composition for pattern formation applied between the partition lines for pattern formation into a downward convex shape; and curing the resin composition for pattern formation that is formed into the downward convex shape in order to form a pattern.
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