Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of fabricating an integrated circuit










Image Number 15 for United States Patent #7759242.

A method of fabricating an integrated circuit, including the steps of forming a first mask layer in the form of a hard mask layer including a plurality of first openings and a second mask layer with at least one second opening which at least partially overlaps with one of the first openings, wherein the at least one second opening is generated lithographically; and at least two neighboring first openings are distanced from each other with a center to center pitch smaller than the resolution limit of the lithography used for generating the second opening.








 
 
  Recently Added Patents
Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same
Autonomous downlink code selection for femto cells
Method and apparatus for verifiable generation of public keys
Weighted determination in configuration management systems
Externally gapped line arrester
Process and intermediates for preparing lapatinib
Method and system for weighted fair queuing
  Randomly Featured Patents
Track roller frame assembly
Digital-signal receiving apparatus
Embossment pattern for absorbent paper products
Dynamically composing processor cores to form logical processors
Gel stick compositions comprising optically enriched gellants
Binoculars
Gradient magnetic coil apparatus and method of manufacturing the same
Reinforcement and container using same
Apparatus for variable displacement type compressor
Router tables