Resources Contact Us Home
Method of fabricating an integrated circuit

Image Number 15 for United States Patent #7759242.

A method of fabricating an integrated circuit, including the steps of forming a first mask layer in the form of a hard mask layer including a plurality of first openings and a second mask layer with at least one second opening which at least partially overlaps with one of the first openings, wherein the at least one second opening is generated lithographically; and at least two neighboring first openings are distanced from each other with a center to center pitch smaller than the resolution limit of the lithography used for generating the second opening.

  Recently Added Patents
Novelty headband
Method of patterning color conversion layer and method of manufacturing organic EL display using the patterning method
Permutational memory cells
Method of processing data and display apparatus for performing the method
Electronic devices with voice command and contextual data processing capabilities
Dispensing of restricted goods
Curved structural part made of composite material and a process for manufacturing such a part
  Randomly Featured Patents
Converging spout outlet nozzle on an offset pump casing
High top moccasin toe walker
Electroluminescent courtesy light with optical element and tube for running board of vehicle
Apparatus, system, and method for replication of data management information
Compositions and methods for treating Demodex infestations
Nonvolatile solid-state memory device using magnetoresistive effect and recording and reproducing method of the same
Method and apparatus for asymmetric communication of compressed speech
Storage medium having electronic circuit, apparatus communicating information with the electronic circuit, and system including them
Thread performance analysis by monitoring processor performance event registers at thread switch
Conveyor having variable speed control