Resources Contact Us Home
Substrate processing apparatus having gas side flow via gas inlet

Image Number 3 for United States Patent #7700054.

An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.

  Recently Added Patents
Computer program and apparatus for evaluating signal propagation delays
Package for a medicinal product
Group of amino substituted benzoyl derivatives and their preparation and their use
Data transfer device and data transfer method
Compounds for the reduction of .beta.-amyloid production
  Randomly Featured Patents
Apparatus and method for monitoring a treatment process in a production interval
Genetic marker for improved milk production traits in cattle
Electronic circuit of an electromagnetic clutch
Computer assisted VOIP communication method and system
Cation concentration measurements
Instant messaging session invite for arranging peer-to-peer communication between applications
Substituted lithium phosphates and solid electrolytes therefrom
Recording system for light-sensitive sheet
Surface modification of boron carbide to form pockets of solid lubricant
Substrate and collector grid structures for electrically interconnecting photovoltaic arrays and process of manufacture of such arrays