Resources Contact Us Home
Substrate processing apparatus having gas side flow via gas inlet

Image Number 3 for United States Patent #7700054.

An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.

  Recently Added Patents
Satellite mounting poles
Switched capacitor hold-up scheme for constant boost output voltage
Methods for measuring media performance associated with adjacent track interference
Adjustable high precision surveying device
Interlock apparatus for vacuum circuit breaker
Enhancing user experiences using aggregated device usage data
  Randomly Featured Patents
Sander vibration isolator
High absorbtivity sodium tripolyphosphate
Use of 5-methoxypsoralen and other furocoumarins as jet lag suppressants
Method of manufacturing a control flap
Bi-directional remote control unit and method of using the same
Hydraulic auxiliary-power steering device
Snowmobile front suspension system
Tea kettle
Fine resolution air control valve