Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of forming a silicon layer and method of manufacturing a display substrate by using the same










Image Number 3 for United States Patent #7696091.

A method of manufacturing a silicon layer includes pretreating a surface of a silicon nitride layer formed on a substrate through a plasma enhanced chemical vapor deposition method using a first reaction gas including at least one of silicone tetrafluoride (SiF.sub.4) gas, a nitrogen trifluoride (NF.sub.3) gas, SiF.sub.4--H.sub.2 gas and a mixture thereof. Then, a silicon layer is formed on the pretreated silicon nitride layer through the plasma enhanced chemical vapor deposition method using a second reaction gas including a mixture of gas including silicon tetrafluoride (SiF.sub.4), hydrogen (H.sub.2) and argon (Ar).








 
 
  Recently Added Patents
Method and system for automatically identifying wireless signal quality of a region
Polishing composition
Bio-pesticide and method for pest control
Barrier layers comprising Ni-inclusive ternary alloys, coated articles including barrier layers, and methods of making the same
Rack
Efficient paging in a wireless communication system
Estimating stack distances
  Randomly Featured Patents
Method for machining crankshaft, apparatus for machining crankshaft, control apparatus and program
OLED display having thermally conductive material
Systems and methods for improving image quality using digital signal processing techniques
Foil bearing mounting
Photographic exposure apparatus
Dead front fuse door
Vibratory cable plow assembly
Dielectric ceramic material
Pulse width modulated self-clocking and self-synchronizing data transmission and method for a telephonic communication network switching system
Compositions and method for enhancement of the transdermal flux of albuterol with a combination of 1-dodecyl-azacyclopheptan-2-one and urea