Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of forming a silicon layer and method of manufacturing a display substrate by using the same










Image Number 3 for United States Patent #7696091.

A method of manufacturing a silicon layer includes pretreating a surface of a silicon nitride layer formed on a substrate through a plasma enhanced chemical vapor deposition method using a first reaction gas including at least one of silicone tetrafluoride (SiF.sub.4) gas, a nitrogen trifluoride (NF.sub.3) gas, SiF.sub.4--H.sub.2 gas and a mixture thereof. Then, a silicon layer is formed on the pretreated silicon nitride layer through the plasma enhanced chemical vapor deposition method using a second reaction gas including a mixture of gas including silicon tetrafluoride (SiF.sub.4), hydrogen (H.sub.2) and argon (Ar).








 
 
  Recently Added Patents
Mobile application for calendar sharing and scheduling
Pharmaceutical dosage form
Laser processing machine
Using storage cells to perform computation
High surface area composition for use in the catalytic hydroconversion of a heavy hydrocarbon feedstock, a method making such composition and its use
Method and apparatus for decoding/encoding a video signal with inter-view reference picture list construction
Front exterior of an automotive tail lamp
  Randomly Featured Patents
Vacuum mechanical rotation-transmitting apparatus
Phenyl pyrazole thioamides
Thermal transfer recording apparatus
Perpendicular magnetic recording medium, its fabrication method and read-write machine using it
Planetary steering differential
Method of producing anhydrous aluminum chloride from acid leach-derived ACH and the production of aluminum therefrom
Method of generating an image
Interchangeable fan blade system
Height adjusting mechanism for a physical therapy bench
Installation shelf arrangement or like storage apparatus in particular for long material