Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of forming a silicon layer and method of manufacturing a display substrate by using the same










Image Number 3 for United States Patent #7696091.

A method of manufacturing a silicon layer includes pretreating a surface of a silicon nitride layer formed on a substrate through a plasma enhanced chemical vapor deposition method using a first reaction gas including at least one of silicone tetrafluoride (SiF.sub.4) gas, a nitrogen trifluoride (NF.sub.3) gas, SiF.sub.4--H.sub.2 gas and a mixture thereof. Then, a silicon layer is formed on the pretreated silicon nitride layer through the plasma enhanced chemical vapor deposition method using a second reaction gas including a mixture of gas including silicon tetrafluoride (SiF.sub.4), hydrogen (H.sub.2) and argon (Ar).








 
 
  Recently Added Patents
Liquid crystal display
Resin composition, prepreg, resin sheet, metal-clad laminate, printed wiring board, multilayer printed wiring board and semiconductor device
Writing implement
Discharge circuit and method
Porous polymeric resins
Calibration method for non-ideal transceivers
Method and apparatus for controlling a multi-node process
  Randomly Featured Patents
Luminous source apparatus, image projecting apparatus and image projection converting apparatus
Armature assembly for electromagnetic door holder
Leaf thickness sensing device
Radio communication base state system including optical advanced base station
Method and system for assessing performance of control systems
Electric power operated clamp with spring lock
Variable speed controller with improved efficiency of energy transfer for an AC induction motor
Key update method and apparatus thereof
Polysialic acid derivatives, methods of production, and uses in enhancing cancer antigen production and targeting
Portable ledge apparatus and method