Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Method of forming a silicon layer and method of manufacturing a display substrate by using the same Image Number 3 for United States Patent #7696091. A method of manufacturing a silicon layer includes pretreating a surface of a silicon nitride layer formed on a substrate through a plasma enhanced chemical vapor deposition method using a first reaction gas including at least one of silicone tetrafluoride (SiF.sub.4) gas, a nitrogen trifluoride (NF.sub.3) gas, SiF.sub.4--H.sub.2 gas and a mixture thereof. Then, a silicon layer is formed on the pretreated silicon nitride layer through the plasma enhanced chemical vapor deposition method using a second reaction gas including a mixture of gas including silicon tetrafluoride (SiF.sub.4), hydrogen (H.sub.2) and argon (Ar).       Recently Added Patents Integration of piezoelectric materials with substrates Brake flush machine Coding method, user equipment and system based on measuring quality of experience of user Procalcitonin-based diagnosis of infections or inflammatory diseases of the respiratory tract in a patient with heart failure TSV backside processing using copper damascene interconnect technology Computer product, apparatus and method for generating configuration-information for use in monitoring information technology services Medical training device   Randomly Featured Patents Heating apparatus Representative color designating method using reliability Device for automatically adjusting tension of endless running member in wrapping connector driving Shaver handle Urine collection device Measuring device with magneto-resistive electrodes, and measuring method Pressure sensitive adhesive tape with central release liner and its use on a jacket portion of insulation member Methods of producing HBsAg Trowel Display stand for tied flies © 2006-2008 PatentGenius. All Rights Reserved.