Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
Hypallergenic mosaic antigens and methods of making same
Method of driving stereoscopic display apparatus and stereoscopic display apparatus
Automatic image-content based adjustment of printer printing procedures
Heterogeneous language data typing without executable regeneration
Noise suppression in speech signals
Pet grooming brush and vacuum attachment
Placental tissue grafts
  Randomly Featured Patents
Hearing device with a contact unit and an associated external unit
Stop block device of measuring tape
Display screen with icon
Test apparatus for semiconductor memory device
Methods and systems for converting images from low dynamic range to high dynamic range
Fluid purification and disinfection device
Method for fabricating a semiconductor device
Combined packaging and display container for a flashlight
Automatic analysis apparatus
Structure and driving method of plasma display panel