Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
System and method for testing an integrated circuit embedded in a system on a chip
JTAG multiplexer with clock/mode input, mode/clock input, and clock output
Tap and linking module TDO register, gating for TCK and TMS
Cryptography on a simplified elliptical curve
Integrated circuit testing with power collapsed
Semiconductor device having a first conductive member connecting a chip to a wiring board pad and a second conductive member connecting the wiring board pad to a land on an insulator covering
  Randomly Featured Patents
Methods and apparatus to determine belt condition in exercise equipment
Circuit board material and electroplating bath for the production thereof
Magnetic write circuit
Swivel elbow (full) male sewer fitting
Semiconductor integrated circuit device with wiring microstructure formed on gates and method of manufacturing the same
Method and device for applying elastic strips in sections onto a web of material used for making diapers
Powdery desulfurizer composition
Surgical device for stapling and fastening body tissues
Emission control device and method of operation thereof