Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
Electronic component mounting machine and operating instruction method for the same
Method for delivering a volatile material
Viewing stand
Activated carbon cryogels and related methods
Video stabilization
Efficient relay automatic repeat request procedure in broadband wireless access system
Biological information monitoring system
  Randomly Featured Patents
Sulfonate- or sulfate-capped anti-misting agents
Built-in toy tray for child exerciser
Security association prefetch for security protcol processing
Process and apparatus for the automatic supply of a machine for processing products in the form of sheets
Cathode ray tube
Fireplace room heater
Shoreline protecting system and apparatus
Shoe upper
Vegetable-based dog chew
Technique and apparatus for use in well testing