Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
Sporting goal practice screen
Method and system for parallelizing data copy in a distributed file system
Polishing composition
Display device and projector
Method for producing organo-oligo silsesquioxanes
Position-measuring device
System and method for video encoding
  Randomly Featured Patents
Goods lift
Ganged jack cover
Improvements in and relating to motors
Disc-decanter centrifuge
Method and apparatus for bit cell repair
Rotary machine electronics supervisory and control apparatus
Process for producing vinyl chloride polymer
Process for the manufacture of a structural element capable of carrying high thermal loads
Prismatic battery
Machining systems and control systems therefor