Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
Iron alloy, iron-alloy member, and process for manufacturing the same
Method and apparatus for realizing cross-connect of optical channel data unit-K
Cleaning method of semiconductor manufacturing process
Systems and methods for dynamic menus
Discovery of security associations for key management relying on public keys
System and method for anticipating wireless signal loss to provide robust location based services
Print media bottom portion printing
  Randomly Featured Patents
Communication apparatus, communication method, and recording medium storing program
Fiber optic attenuator
Monocomponent developer comprising surface treated toners
Semiconductor device
Diaphragm movement device
Implantable devices with polymeric detachment junction
Suspended luminaire
Light fixture
Filling device for use in manufacturing of gel filled prostheses