Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
Cucumber plants with a compact growing habit
Wrench head
Anti-phishing system and method
Weighted determination in configuration management systems
Process for producing dipeptides or dipeptide derivatives
Spectral sensor for checking documents of value
Toner cartridge and image forming apparatus including the same
  Randomly Featured Patents
Navigation through components
Handling hook assembly
Pyrimidines useful as modulators of voltage-gated ion channels
Induction heating cooking apparatus
Damper for braking rotation
Portable elevated horticultural work station
Head assembly having microactuator
Non-casual error diffusion method and apparatus
Thermal printer
Aluminum galvanic cell