Resources Contact Us Home
Method of manufacturing semiconductor device

Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.

  Recently Added Patents
Linear book scanner
Belt with light
Multilevel directory assistance apparatus and method
Droplet generation and detection device, and droplet control device
Portable stand
Automatic stop and restart device for an engine
Statistical identification of instances during reconciliation process
  Randomly Featured Patents
Mine roof support method and apparatus
Process and methods of purification for the manufacture fluorocarbons
Enzyme-catalyzed polycarbonate and polycarbonate ester synthesis
Ring opening monomers
Therapeutics to inhibit MLL-menin interaction for treating leukemia
Mechanical eyelash curler
Conductive polymers and method of preparation thereof
Cleaning device having potential applying member and image forming apparatus having a reciprocating recording material carrying member
Light for attachment to a cellular phone
Method, apparatus and system of eliminating static charge and filling and sterilizing resin vessel