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Method of manufacturing semiconductor device










Image Number 14 for United States Patent #7682927.

A method for manufacturing a semiconductor device includes coating a solution containing a perhydrosilazane polymer on a substrate, heating the solution to form a film containing the perhydrosilazane polymer, and oxidizing the film in a water vapor atmosphere at a reduced pressure to convert the film into an insulating film containing silicon and oxygen.








 
 
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Method for production of semiconductor device