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Projection optical system and method for photolithography and exposure apparatus and method using same










Image Number 19 for United States Patent #7580197.

A liquid immersion optical system includes a first optically transparent member and a second optically transparent member, arranged in an optical path between the first optically transparent member and an object. A first space between the first optically transparent member and the second optically transparent member is fillable with a first liquid. A second space between the second optically transparent member and the object is fillable with a second liquid. The second optically transparent member is detachably arranged in the optical path between the first optically transparent member and the object.








 
 
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