Resources Contact Us Home
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

  Recently Added Patents
Focus adjustment unit and optical scanning microscope
Liquid crystal display apparatus
Critical word forwarding with adaptive prediction
Engine RPM control device
Sensor apparatus and information processing apparatus
Thin film switch and press key/keyboard using the same
Fuel cell with air channel actuator
  Randomly Featured Patents
Fluid transmitting system with lock-up clutch
Meat tenderizer
Shoe traction system
Armature group for mosaic printing head and related manufacturing method
Bicycle frame with supplemental step or platform for performing freestyle maneuvers
Optical measuring system
N-state ripple adder scheme coding with corresponding n-state ripple adder scheme decoding
Storage apparatus and method for controlling the same
Fixing device for fixing developer to recording material and image forming apparatus equipped with the same
Vapor degreaser apparatus