Resources Contact Us Home
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

  Recently Added Patents
Power collecting device, power measuring device, and power collecting method
Motor drive component verification system and method
Centralized behavioral information system
Hand-held electronic display device
PVD coated tool
Scoring records for sorting by user-specific weights based on relative importance
Method for transitioning between Ziegler-Natta and metallocene catalysts in a bulk loop reactor for the production of polypropylene
  Randomly Featured Patents
Wall-mounted hook plate
Optical waveguide and manufacturing method thereof
Das5, a P450 protein involved in the brassinosteroid biosynthesis pathway in plants
Memory card
Computer with a memory system for remapping a memory having two memory output buses for high resolution display with scrolling of the displayed characters
Hat-based oximeter sensor
Process for preparing diesters of higher .alpha.,.omega.-dicarboxylic acids
Networking apparatus which detects a stoppage of data transfer in a processing apparatus on a data origination side and then cancels the corresponding path in the switching unit
Hood for prevention of scalp hair loss