Resources Contact Us Home
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

  Recently Added Patents
Data storage device and block selection method for a flash memory
Receiver with feedback continuous-time delta-sigma modulator with current-mode input
Methods for detecting DNA-binding proteins
Solid-state image pickup element, method of manufacturing the same, and image pickup apparatus including the same
Buffering stop structure and corresponding packing case
Method for fabricating a nitrided silicon-oxide gate dielectric
Electronic multiparty accounts receivable and accounts payable system
  Randomly Featured Patents
System and method for segmenting bones on MR images
Methods and means for control of proliferation of remnant cells following surgery
Metal oxides dispersant composition
Discharge lamp lighting device, illumination device, and projector
Optical isolator
Real-time dosimetry system, RTDS
Semiconductor apparatus and a semiconductor device mounting method
System for indicating the position of a surgical probe within a head on an image of the head
Rear combination lamp for vehicle