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Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system










Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.








 
 
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