Resources Contact Us Home
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

  Recently Added Patents
Methods and compositions for inhibition of neutrophil exocytosis
Optoelectronic semiconductor chip comprising a reflective layer
Data scrambling in memory devices
Performance metrics processing for anticipating unavailability
Display system, display control method and computer program
Image sensor with improved color crosstalk
Gyroscope utilizing torsional springs and optical sensing
  Randomly Featured Patents
Process for manufacturing electrolytically chromated steel sheet
Spiral member support for cork extractor
Device for feeding a pressure medium into a shaft
Production planning system
System and method detecting malfunction of pad conditioner in polishing apparatus
Adjustable energy quantum thin film plasma processing system
Multi-compartment storage and delivery containers and delivery system for microencapsulated fragrances
Illumination device and manufacturing method thereof
Fibrous wall material for cell structures of solar energy collectors
Mitigating the adverse effects of charge sharing in dynamic logic circuits