Resources Contact Us Home
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

  Recently Added Patents
Dimmer system and damper circuit thereof
Method and system for electronic assistance in dispensing pharmaceuticals
Lighting apparatus
Deposition apparatus and method for manufacturing organic light emitting diode display using the same
Leaky wave mode solar receiver
Generating wiki pages from content and transformation objects
Method and system for providing status of a machine
  Randomly Featured Patents
Grafting of hindered C-nitro compounds onto polymers
Method and device for testing the quality of a metallic coating
Methods and apparatus for selecting digital access technology for programming and data delivery
Airbag apparatus for a front passenger's seat
Printed circuit board with increased arc track resistance
Controllable variable depth mooring system and method
Tape cartridge reel lock
Cooled lighting apparatus and method
Cutting insert for chip forming machining of work pieces
Prosthetic valve that permits retrograde flow