Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system










Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.








 
 
  Recently Added Patents
Method and system for fail-safe call survival
Implantable device
Performing failover for a plurality of different types of videoconferencing devices
Switchgear operating apparatus and three-phase switchgear
Reducing energy and increasing speed by an instruction substituting subsequent instructions with specific function instruction
Method for improving the performance of browser-based, formula-driven parametric objects
Snap-engagement structure
  Randomly Featured Patents
Noise abatement apparatus for appliance cabinet and method for reducing noise generated by an appliance
Heat-sensitive recording material
Salvia plant named `Florsaldblue`
Syphonic flush toilet
Method and system for detecting narrowband signals using a receiver with a wideband frontend
Stackable container
Estimating the time to print a document
Small molecule transcriptional activation domains
1-arylethyl-3-substituted piperidines
Low current wide VREF range input buffer