Resources Contact Us Home
Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Image Number 14 for United States Patent #7566379.

The present invention presents an improved upper electrode for a plasma processing system, wherein the design and fabrication of an electrode plate with a deposition shield coupled to the upper electrode advantageously provides gas injection of a process gas with substantially minimal erosion of the upper electrode while providing protection to a chamber interior.

  Recently Added Patents
Semiconductor device
Method of and apparatus for recording motion picture, which generate encoded data with higher compression efficiency using a motion vector similarity
Stand for food service
Electronic multiparty accounts receivable and accounts payable system
Light-emitting device, film-forming method and manufacturing apparatus thereof, and cleaning method of the manufacturing apparatus
Sub-LUN input/output profiling for SSD devices
  Randomly Featured Patents
Suppositories containing analgesics, antipyretics or anti-inflammatory agents
Golf club shaft grip assembly
Interferometric detector with fibre-optic sensor
Light guide device
Apodization technique for enhanced resolution of images
Bearing retainer for trunnion mounted ball valve
Control system for environmental apparatus
Diagnostic methods and systems for active fuel management systems
Powered slider drive interface and drive assembly
Baseball/softball equipment bag