Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method of manufacturing polysilicon thin film and method of manufacturing thin film transistor having the same










Image Number 10 for United States Patent #7557050.

In a method of manufacturing a polysilicon thin film and a method of manufacturing a TFT having the thin film, a laser beam is irradiated on a portion of an amorphous silicon thin film to liquefy the portion of the amorphous silicon thin film. The amorphous silicon thin film is on a first end portion of a substrate. The liquefied silicon is crystallized to form silicon grains. The laser beam is shifted from the first end portion towards a second end portion of the substrate opposite the first end portion by an interval in a first direction. The laser beam is then irradiated onto a portion of the amorphous silicon thin film adjacent to the silicon grains to form a first polysilicon thin film. Therefore, electrical characteristics of the amorphous silicon thin film may be improved.








 
 
  Recently Added Patents
Computer system for routing package deliveries
Electronic control apparatus
Fixing device, fixing device control method, and image forming apparatus
Power supply input voltage detection circuit
Housing for gas flow indicator
Digital microwave radio link with adaptive data rate
Method and apparatus for generating soft bit values in reduced-state equalizers
  Randomly Featured Patents
Antistatic poly(vinyl chloride) composition
Combined flosser and floss dispenser device
Depilation apparatus
Power control method of discontinuous transmission
Pyrazolo pyrimidines
Thermocontact welding method and apparatus, and welded product
Laser level detector
Electronic device mounting structure
Self-relieving choke adjustment apparatus
Method of joining pipes