Resources Contact Us Home
Polishing pad, use thereof and method for manufacturing the same

Image Number 2 for United States Patent #7556555.

The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.

  Recently Added Patents
Integrated circuit packaging system with laser hole and method of manufacture thereof
Apparatus for electrographic printing or copying
Active pellet without chemical additives
Fan guide
.beta.-2 microglobulin as a biomarker for peripheral artery disease
Drive coil, measurement probe comprising the drive coil and methods utilizing the measurement probe
Solid-state image capture device and image capture apparatus
  Randomly Featured Patents
Oxygen controlling wastewater treatment system
N-heterocyclic derivatives of benzamides and their use in treating gastric and intestinal disorders
Method and apparatus for signalling in a shared protection ring architecture
Production of magnetic recording media having a backing coating
Fluorinated carbon filled latex fluorocarbon elastomer
Catalyst for the hydroisomerization of contaminated hydrocarbon feedstock
Communication apparatus and coexistence method for enabling coexistence of communication systems
Height-control device for the elevatable implement of an agricultural harvesting machine
Apparatus and method for manually smoothing and cleaning ceramic articles