Resources Contact Us Home
Polishing pad, use thereof and method for manufacturing the same

Image Number 2 for United States Patent #7556555.

The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.

  Recently Added Patents
Security arrangements for extended USB protocol stack of a USB host system
Antenna module and wireless communication apparatus
Distributed mobile access point acquisition
Maesa japonica extracts and methods of use
Peer-to-peer, internet protocol telephone system with proxy interface for configuration data
Container pack
Thermoplastic resin composition
  Randomly Featured Patents
Changing images in digital-image senders
Resin-sealed package and method of producing the same
Lipoprotein associated phospholipase A.sub.2, inhibitors thereof and use of the same in diagnosis and therapy
Forage harvester cutterhead with baffle means
Addressing multistable nematic liquid crystal device
Method of reading nonvolatile memory device and method of operating nonvolatile memory device
Floor cleaning pad
System for load balancing by replicating portion of file while being read by first stream onto second device and reading portion with stream capable of accessing
Small container for cosmetics
Bi-functional pyrazolopyridine compounds