Resources Contact Us Home
Polishing pad, use thereof and method for manufacturing the same

Image Number 2 for United States Patent #7556555.

The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.

  Recently Added Patents
Medical capsule housing formed by thermal welding
Solar energy converter with improved photovoltaic efficiency, frequency conversion and thermal management permitting super highly concentrated collection
System and method for employing signoff-quality timing analysis information concurrently in multiple scenarios to reduce dynamic power in an electronic circuit and an apparatus incorporating t
System and method for conditionally sending a request for data to a home node
Metal halide lamps with fast run-up and methods of operating the same
Polypeptides and immunizing compositions containing gram positive polypeptides and methods of use
Memory elements with increased write margin and soft error upset immunity
  Randomly Featured Patents
Turbine rotor
Levelling agent and anti-cratering agent
Gas mixer
Shutter for a toner cartridge for use with an image forming device
Golf club alignment device
Non-contact EKG
Filtering for public databases with naming ambiguities
Gloves for mechanics
System for controlling air-fuel ratio
Machining apparatus with coolant-operated clamp device