Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Cleaning method and solution for cleaning a wafer in a single wafer process










Image Number 18 for United States Patent #7456113.

The present invention is a method of use of a novel cleaning solution in a single wafer cleaning process. According to the present invention the method involves using a cleaning solution in a single wafer mode and the cleaning solution comprises at least ammonium hydroxide (NH.sub.4OH), hydrogen peroxide (H.sub.2O.sub.2), water (H.sub.2O) and a chelating agent. In an embodiment of the present invention the cleaning solution also contains a surfactant. Moreover, the present invention also teaches a method of combining an ammonia hydroxide, hydrogen peroxide, and chelating agent step with a short HF step in a fashion that minimizes process time in a way that the entire method removes aluminum and iron contamination efficiently without etching too much oxide.The single wafer cleaning processes may also be used to increase the yield of high-grade reclaimed wafers.








 
 
  Recently Added Patents
Charging seat having cleaning member
Computerized apparatus for identifying industries for potential transfer of a job function
Shoe
System and method for providing advertising content using a group training system
Photon density wave based determination of physiological blood parameters
.beta.-2 microglobulin as a biomarker for peripheral artery disease
Method for selective deposition of a semiconductor material
  Randomly Featured Patents
Flat-paneled flower pot or flower pot cover die
Precious metal solder
Safety mechanism to prevent accidental patient injection and methods of same
Heat exchanger for solid-state electronic devices
Receptacle carriage, dispenser and discharge device
Method and apparatus for instrument placement
Plant growth regulator composition comprising a cyclohexanone compound and adjuvants
Artificial grass for landscaping
Grill guard for vehicle front end
6-modified bicyclic nucleic acid analogs