Resources Contact Us Home
Cleaning method and solution for cleaning a wafer in a single wafer process

Image Number 13 for United States Patent #7456113.

The present invention is a method of use of a novel cleaning solution in a single wafer cleaning process. According to the present invention the method involves using a cleaning solution in a single wafer mode and the cleaning solution comprises at least ammonium hydroxide (NH.sub.4OH), hydrogen peroxide (H.sub.2O.sub.2), water (H.sub.2O) and a chelating agent. In an embodiment of the present invention the cleaning solution also contains a surfactant. Moreover, the present invention also teaches a method of combining an ammonia hydroxide, hydrogen peroxide, and chelating agent step with a short HF step in a fashion that minimizes process time in a way that the entire method removes aluminum and iron contamination efficiently without etching too much oxide.The single wafer cleaning processes may also be used to increase the yield of high-grade reclaimed wafers.

  Recently Added Patents
Data storage device and block selection method for a flash memory
Device for transmitting data between a serial data bus and working modules such as actuator modules and/or I/O modules
Compositions of quaternary ammonium compounds containing bioavailability enhancers
Micromachined devices and fabricating the same
Polynucleotide capture materials, and methods of using same
Normalized contextual performance metric for the assessment of fatigue-related incidents
Badge or pin
  Randomly Featured Patents
Solids removal from viscous liquids
System and device for inflating and sealing air inflated cushioning material
Method of generating partial differential equations for simulation, simulation method, and method of generating simulation programs
Gas Turbine engine casing construction
Modified Vaccinia Ankara virus variant and cultivation method
Method and means for improving molten metal furnace charging efficiency
Functionalized ionic liquids, and methods of use thereof
Mobile dental unit
Micro impact wrench
Radio paging system for improving message receive ratio by reducing intermodulation noise