Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method to chemically remove metal impurities from polycide gate sidewalls










Image Number 8 for United States Patent #7358171.

An embodiment includes a process of forming a gate stack that acts to resist the redeposition to the semiconductive substrate of mobilized metal such as from a metal gate electrode. An embodiment also relates to a system that achieves the process. An embodiment also relates to a gate stack structure that provides a composition that resists the redeposition of metal during processing and field use.








 
 
  Recently Added Patents
Method of transmitting and receiving a paging message in a mobile communication system
Ice data collection system
Reoccuring keying system
Image forming apparatus
Terminal device and image printing method
Fluid discrimination device
Substantially aligned boron nitride nano-element arrays and methods for their use and preparation
  Randomly Featured Patents
Organic light emitting display device and method of manufacturing the same
Lead-europium-selenide-telluride diode laser
Air filter
Semiconductor memory device
Method, system and apparatus for detecting defects in a honeycomb body using a particulate fluid
High coupling memory cell
Rubber-backed expansion joint
Electrolysis solution for electrolytic capacitor, and electrolytic capacitor
Processor utilizing a loop buffer to reduce power consumption
Horizontal rotating drum fermentor