Resources Contact Us Home
Method to chemically remove metal impurities from polycide gate sidewalls

Image Number 8 for United States Patent #7358171.

An embodiment includes a process of forming a gate stack that acts to resist the redeposition to the semiconductive substrate of mobilized metal such as from a metal gate electrode. An embodiment also relates to a system that achieves the process. An embodiment also relates to a gate stack structure that provides a composition that resists the redeposition of metal during processing and field use.

  Recently Added Patents
XDSL system and signal transmission method, sending device, and receiving device of xDSL system
Containers having radio frequency identification tags and method of applying radio frequency identification tags to containers
Base station synchronization for a single frequency network
Hypallergenic mosaic antigens and methods of making same
Method and an apparatus for processing an audio signal
Liquid crystal display and manufacturing method thereof
Stain-blocking aqueous coating composition
  Randomly Featured Patents
Water resistant gasket for conduits and the like
Multichannel x-ray spectrometer
Virtual resource ID mapping
Thermal printhead
Phase change material structure and related method
Method and apparatus for obtaining transmit diversity using switched antennas
Shared slab AWG circuits and systems
Systems and methods for blocking selected commercials
Absorption unit with variant control system
Process for preparation of a mixture of alcohols and ketones by liquid phase oxidation of higher alkanes