Resources Contact Us Home
Method to chemically remove metal impurities from polycide gate sidewalls

Image Number 8 for United States Patent #7358171.

An embodiment includes a process of forming a gate stack that acts to resist the redeposition to the semiconductive substrate of mobilized metal such as from a metal gate electrode. An embodiment also relates to a system that achieves the process. An embodiment also relates to a gate stack structure that provides a composition that resists the redeposition of metal during processing and field use.

  Recently Added Patents
Compact bus bar assembly, switching device and power distribution system
Coding circuitry for difference-based data transformation
SONOS stack with split nitride memory layer
High-voltage AC light-emitting diode structure
Carrier or transport strip
Method of requesting CQI reports
Wireless communication method, wireless communication system, and mode switching method
  Randomly Featured Patents
Horse race board game apparatus
Film resource manager
Method and apparatus for managing a connection in a connection orientated environment
Locking device for docking station
Scroll compressor having grooved thrust bearing
Position limiting switch assembly
Channel access control in a communication system
Optical instruments
Electrical connector having a terminal position assurance device
Combined motion picture and television studio building structure