Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Method to chemically remove metal impurities from polycide gate sidewalls










Image Number 5 for United States Patent #7358171.

An embodiment includes a process of forming a gate stack that acts to resist the redeposition to the semiconductive substrate of mobilized metal such as from a metal gate electrode. An embodiment also relates to a system that achieves the process. An embodiment also relates to a gate stack structure that provides a composition that resists the redeposition of metal during processing and field use.








 
 
  Recently Added Patents
Substituted di-arylhydantoin and di-arylthiohydantoin compounds and methods of use thereof
Plants and seeds of hybrid corn variety CH336383
Handheld electronic communication device having sliding display
System and method for optimizing use of plug-in air conditioners and portable heaters
Direct mode adapter based shortcut for FCoE data transfer
Enhancing user experiences using aggregated device usage data
Container pack
  Randomly Featured Patents
Power beyond steering unit with bypass
Wireless authentication protocol
Purification of NGF
Desoldering tip replacement apparatus or the like
Seismic isolation device
Organic compounds
Display device for a magnetic tape recording and/or reproducing apparatus
Process for obtaining UO.sub.2 fuel pellets from metallic U without producing any effluent
Skylights and windows comprising polyester compositions formed from 2,2,4,4,-tetramethyl-1,3-cyclobutanediol and 1,4-cyclohexanedimethanol
Component suction site-teaching system and method