Resources Contact Us Home
Method to chemically remove metal impurities from polycide gate sidewalls

Image Number 3 for United States Patent #7358171.

An embodiment includes a process of forming a gate stack that acts to resist the redeposition to the semiconductive substrate of mobilized metal such as from a metal gate electrode. An embodiment also relates to a system that achieves the process. An embodiment also relates to a gate stack structure that provides a composition that resists the redeposition of metal during processing and field use.

  Recently Added Patents
Cable exit trough with insert
Computer-implemented method of constructing a stock index using index rotation
Chip on chip semiconductor device including an underfill layer having a resin containing an amine-based curing agent
Systems and methods for managing fleet services
Test framework of visual components in a multitenant database environment
Process for improving the hydrolysis of cellulose in high consistency systems using one or more unmixed and mixed hydrolysis reactors
  Randomly Featured Patents
Personal care device
Antiviral compounds
Pedicure sandal system
Ejection mechanism for compact flash card connector
Rotation hook
Compact service module for use in electrolytic aluminum production plants
Tumor specific glycoproteins and method for detecting tumorigenic cancers
Mounting arrangement for electromagnet driving structures in a mosaic needle printer head
Method of manufacturing a porous material