Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Near-field photo-lithography using nano light emitting diodes










Image Number 3 for United States Patent #7274998.

An embodiment of the present invention is a technique to pattern features. An array of nanowires is placed at a distance to a resist layer. The array forms a plurality of light emitting diodes (LEDs). The distance corresponds to a near-field region of the light emitted by the LEDs with respect to the resist layer. A control circuit controls the LEDs to emit the light to pattern a feature in the resist layer.








 
 
  Recently Added Patents
Cooler
Method and apparatus for interactive distribution of digital content
Use of physical deformation during scanning of an object to generate views of the object
Virtual billboards
Animation control apparatus, animation control method, and non-transitory computer readable recording medium
Method of targeting hydrophobic drugs to vascular lesions
Vacuum cleaner
  Randomly Featured Patents
Luminaire
Market research booklet
RF circuit assembly
Dialog repair based on discrepancies between user model predictions and speech recognition results
System for wound closure
Capacitive proximity sensor for automotive use
Computing device with relatively limited storage space and operating / file system thereof
Thermostat bypass system
Ink supply system for use in an ink-jet printer
Powerless air charging apparatus, system, and method