Resources Contact Us Home Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE     Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof Image Number 5 for United States Patent #7241558. Stabilization of photolithography process parameters, the photomask being used, and the manufacturing method thereof is provided where a formal pattern layout is combined with a dummy pattern. A photomask is manufactured by utilizing the combined pattern layout so that density changes between the pattern structure layers of the multi-layer semiconductor integrated circuits are minimized.       Recently Added Patents Method of making fluorinated alkoxy carboxylic acids and precursors thereof Multi-speed transmission having three planetary gear sets Electromigration-resistant and compliant wire interconnects, nano-sized solder compositions, systems made thereof, and methods of assembling soldered packages Imaging device program and method for preventing the generation of flicker Strings of memory cells having string select gates, memory devices incorporating such strings, and methods of accessing and forming the same Temperature independent reference circuit Wind turbine   Randomly Featured Patents Inhibition of human squamous cell carcinoma growth in vivo by epidermal growth factor receptor antisense RNA transcribed from a Pol III promoter Cable connector assembly Active matrix substrate and switching element Fluid intensifier Phase locked loop circuit Arrangement in one or more units disposed in an outer unit Axially slideable plenum for circulation control aircraft Apparatus and device used in marking a batter's box Methods of forming self-aligned contact pads on electrically conductive lines Recording medium, recording apparatus, reproducing method, and reproducing apparatus © 2006-2008 PatentGenius. All Rights Reserved.