Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof










Image Number 5 for United States Patent #7241558.

Stabilization of photolithography process parameters, the photomask being used, and the manufacturing method thereof is provided where a formal pattern layout is combined with a dummy pattern. A photomask is manufactured by utilizing the combined pattern layout so that density changes between the pattern structure layers of the multi-layer semiconductor integrated circuits are minimized.








 
 
  Recently Added Patents
Shot scent dispenser
Roll of continuous web of optical film laminate and production method therefor
Apparatus and method for multiplying frequency of a clock signal
Undercabinet plug-in mount
PC secure video path
Semiconductor device and fabrication method
Pointer display device, pointer display/detection method, pointer display/detection program and information apparatus
  Randomly Featured Patents
Query-based spares management technique
Automated tape lettering machine
Mobile computer with PC housing for PC card and dongle
MOS transistor circuit and voltage-boosting booster circuit
Ground bar
Dynamoelectric machine, methods of assembling such, terminal board assembly, and method of assembling a switch device with a supporting means therefor
Linear displacement actuator
Device for measuring flow
Data processing systems and methods for pulse oximeters
Systems and methods for managing power for data storage devices