Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof










Image Number 3 for United States Patent #7241558.

Stabilization of photolithography process parameters, the photomask being used, and the manufacturing method thereof is provided where a formal pattern layout is combined with a dummy pattern. A photomask is manufactured by utilizing the combined pattern layout so that density changes between the pattern structure layers of the multi-layer semiconductor integrated circuits are minimized.








 
 
  Recently Added Patents
Nozzle
System and method for providing private demand-driven pricing
Avirulent oncolytic herpes simplex virus strains engineered to counter the innate host response
Regulating a supply voltage provided to a load circuit
Navigating applications using side-mounted touchpad
Automated pizza preparation and vending system
Encryption using alternate authentication key
  Randomly Featured Patents
Indexable cutting tool insert and cutting tool
Method for supplying an internal combustion engine with conditioned combustion gas, device for carrying out said method, method for determining the quantities of pollutants in the exhaust gase
Hydraulic pumping arrangements
Optical current transformer
Deck hinge
Data embedding employing degenerate clusters of data having differences less than noise value
Blank for acetabular prosthesis
Syringe tip cap
Hospital bed communication and control device
Equine back wrap