Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Multi-layer semiconductor integrated circuits enabling stabilizing photolithography process parameters, the photomask being used, and the manufacturing method thereof










Image Number 3 for United States Patent #7241558.

Stabilization of photolithography process parameters, the photomask being used, and the manufacturing method thereof is provided where a formal pattern layout is combined with a dummy pattern. A photomask is manufactured by utilizing the combined pattern layout so that density changes between the pattern structure layers of the multi-layer semiconductor integrated circuits are minimized.








 
 
  Recently Added Patents
Large carrying case
Milk frother
State control of remote hosts for management of distributed applications
Electrostatic charger and image forming apparatus
Data processing circuit with arbitration between a plurality of queues
Method and composition for hyperthermally treating cells
Sub-resolution assist feature repair
  Randomly Featured Patents
Mechanism for containing input pen
Swimming pool aeration cleaning system
Air regenerating apparatus
Brush cleaning unit for the heater fixture of a smoking device
Soft pretzel
Drive arrangement for an electric motor vehicle and process for shifting gears
System and method for providing global media content delivery
Pressure relief valve and arrangement for fire suppression water sprinkler system
Combination grounding rod bridge
Exercise walkway