Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Substrate processing method










Image Number 11 for United States Patent #7226874.

A substrate processing method forming an oxynitride film by nitriding an oxide film formed on a silicon substrate includes a nitridation processing step that nitrides a surface of the oxide film by radicals or ions formed by exciting a nitrogen gas by microwave-excited plasma, the nitridation processing is conducted at a substrate temperature of 500.degree. C. or less by setting an electron temperature of the microwave-excited plasma to 2 eV or less, and by setting the resident time of oxygen in the processing space in which the substrate to be processed is held, to two seconds or less.








 
 
  Recently Added Patents
Method and system for a low-power client in a wide area network
System and method for deriving cell global identity information
Apparatus for touch screen avionic device
Toner cartridge and image forming apparatus including the same
Adaptive control for uncertain nonlinear multi-input multi-output systems
Fluorescent dyes, fluorescent dye kits, and methods of preparing labeled molecules
Printing system, information processing apparatus, print job processing method, information processing method, program, and storage medium
  Randomly Featured Patents
Two stage cup
Scene-change detector for a moving image composed of a plurality of frames
Atomic absorption spectrophotometer
System and method for improving emitter life in flat panel field emission displays
Low molecular weight polymers and copolymers
Transcutaneous electrical nerve stimulation device and method
Vehicle door lock actuator
Manufacture of vitreous silica product via a sol-gel process using a polymer additive
Flower planter kit
Pendant amusement device