Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Substrate processing method










Image Number 11 for United States Patent #7226874.

A substrate processing method forming an oxynitride film by nitriding an oxide film formed on a silicon substrate includes a nitridation processing step that nitrides a surface of the oxide film by radicals or ions formed by exciting a nitrogen gas by microwave-excited plasma, the nitridation processing is conducted at a substrate temperature of 500.degree. C. or less by setting an electron temperature of the microwave-excited plasma to 2 eV or less, and by setting the resident time of oxygen in the processing space in which the substrate to be processed is held, to two seconds or less.








 
 
  Recently Added Patents
Methods of saccharification of polysaccharides in plants
Semiconductor device
Dynamic association and disassociation of threads to device functions based on requestor identification
Sulfonated amorphous carbon, process for producing the same and use thereof
Semiconductor device having a first conductive member connecting a chip to a wiring board pad and a second conductive member connecting the wiring board pad to a land on an insulator covering
Instrumenting configuration and system settings
Tools and methods for yield-aware semiconductor manufacturing process target generation
  Randomly Featured Patents
Container with internal compartment
Method and device for coating substrates in a vacuum
Buffered memory having a control bus and dedicated data lines
Automatic tuning method for the feedback control of a motion simulator, and related device
Device for taking samples of radioactive and/or toxic suspensions containing solids
Display apparatus comprising a cathode ray tube (CRT)
Wrist watch case with band
Main tool and T-square for scrapbooking work surface
Device, system and method for monitoring animal posture pattern
Spread spectrum intercept apparatus and method