Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Nanoelectronic devices and circuits










Image Number 5 for United States Patent #7224026.

Diode devices with superior and pre-settable characteristics and of nanometric dimensions, comprise etched insulative lines (8, 16, 18) in a conductive substrate to define between the lines charge carrier flow paths, formed as elongate channels (20) at least 100 nm long and less than 100 nm wide. The current-voltage characteristic of the diode devices are similar to a conventional diode, but both the threshold voltage (from 0V to a few volts) and the current level (from nA to .mu.A) can be tuned by orders of magnitude by changing the device geometry. Standard silicon wafers can be used as substrates. A full family of logic gates, such as OR, AND, and NOT, can be constructed based on this device solely by simply etching insulative lines in the substrate.








 
 
  Recently Added Patents
Dithering method and apparatus
Mold for nanoimprinting, its production process, and processes for producing molded resin having fine concavo-convex structure on its surface and wire-grid polarizer
Manufacturing aircraft parts
Vehicle-mounted camera stabilized passively by vibration isolators
Information processing apparatus, including updating of program and program information, and method of updating program of the information processing apparatus
Analyte assaying by means of immunochromatography with lateral migration
Portable hand-held multi-function device for storing, managing and combining rewards
  Randomly Featured Patents
System and method for reducing power consumption of memory
Fluidized bed filtering and/or heat exchange apparatus particularly for gaseous discharges from internal combustion engines and industrial plants
Foot-operated cabinet door opener
Multifunction-RF-circuit
High performance semipermeable composite membrane and process for producing the same
Plumbing fixture with integral strainer
Herbicidal 2-(5-isoxazolinyl methyloxyphenyl)-4,5,6,7-tetrahydro -2H-indazole derivatives
Method for performing a deep trench etch for a planar lightwave circuit
Transflective film and liquid crystal display device using the same
Laser driving device, optical scanning device, and image forming apparatus