Resources Contact Us Home
Process for controlling performance characteristics of a negative differential resistance (NDR) device

Image Number 10 for United States Patent #7220636.

A variety of processes are disclosed for controlling NDR characteristics for an NDR element, such as peak-to-valley ratio (PVR), NDR onset voltage (V.sub.NDR) and related parameters. The processes are based on conventional semiconductor manufacturing operations so that an NDR device can be fabricated using silicon based substrates and along with other types of devices.

  Recently Added Patents
Methods, systems, and computer-readable media for providing an event alert
Apparatus for tuning a musical instrument, and a related instrument
Method, apparatus or computer program for changing from scheduled to unscheduled communication modes
System and method for video encoding
Resin composition and display device using the same
Interlock apparatus for vacuum circuit breaker
Remote controller
  Randomly Featured Patents
Disposable cutting sheet
Electronic stylus
Method of making a thin film transistor
Vented valve mechanism for internal combustion engines
Method, apparatus, and medium for migration across link technologies
Annular blowout preventer with upper and lower spherical sealing surfaces and rigid translation element
Gas burner
System and method for controlling network bus communications for input-output interlocking information among distributed programmable controllers
Probe speculative address file
Method of forming crisp white indicia in aluminum