Resources Contact Us Home
Method and apparatus for position-dependent optical metrology calibration

Image Number 3 for United States Patent #7215419.

A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference.

  Recently Added Patents
Using location based services for determining a calling window
Method for treating wounds for mammals, wound healer compound, and method of manufacturing thereof
Ventilated vacuum communication structure
High power fiber amplifier with stable output
Magnifying glass
Light-emitting diode devices
Profiling activity through video surveillance
  Randomly Featured Patents
Methods of treating dry eye disorders
Temporal vision modification
2D/3D data projector
Roll-out thermal envelope roof de-icing system
Decorative mask assembly
Helmet lining
Image-forming method employing light-sensitive material and a transparent image-receiving material
Compact supercharger with improved lubrication
Communications transmission media
Plant sorbitol biosynthetic enzymes