Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process










Image Number 9 for United States Patent #7189498.

The present invention provides methods and apparatus for accomplishing a strong phase shift direct write lithography process using reconfigurable optical mirrors. A maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used to generate strong phase shift optical patterns which are directed onto a photoimageable layer of a substrate in order to facilitate pattern transfer. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement.








 
 
  Recently Added Patents
Techniques for determining optimized local repair paths
Sequential control device for a striking mechanism
Highly detectable pilot structure
Editing device and editing method
Detecting mirrors on the web
Sock
Methods and systems for assessing sales activity of a merchant
  Randomly Featured Patents
Single-site catalysts for olefin polymerization
Light emitting device including plural barriers
Sterilizing vacuum cleaner
Security holder for a cassette tape
Automatically configuring SCSI device addresses using SCSI controller storing predetermined ID and, producing address signals for transferring to peripheral device via SCSI ID input means
Hydraulically damped sleeve bearing
Silver salt direct positive emulsion
Glass-forming liquid crystalline compositions and optical devices formed therefrom
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
Chair