Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process










Image Number 9 for United States Patent #7189498.

The present invention provides methods and apparatus for accomplishing a strong phase shift direct write lithography process using reconfigurable optical mirrors. A maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used to generate strong phase shift optical patterns which are directed onto a photoimageable layer of a substrate in order to facilitate pattern transfer. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement.








 
 
  Recently Added Patents
Reference circuit with curvature correction using additional complementary to temperature component
Business flow processing method and apparatus
Image forming system, printing control method, and program
Inhibitor of casein kinase 1delta and casein kinase 1E
Integrated circuit packaging system with interconnects and method of manufacture thereof
Architectural panel with millet and grass
Stereoscopic display
  Randomly Featured Patents
Circular accelerator with adjustable electron final energy
Foot support
Process for the manufacture of a ceramic foam part
Table grill
Microwave excited ultraviolet lamp system with single electrical interconnection
Joining bipolar plates using localized electrical nodes
Valve/sensor assemblies
Detectability of buried elongated objects such as pipes, ducts and conduits
Systems and methods of RF power transmission, modulation, and amplification, including architectural embodiments of same
Sheet feed method and apparatus