Resources Contact Us Home
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process

Image Number 9 for United States Patent #7189498.

The present invention provides methods and apparatus for accomplishing a strong phase shift direct write lithography process using reconfigurable optical mirrors. A maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used to generate strong phase shift optical patterns which are directed onto a photoimageable layer of a substrate in order to facilitate pattern transfer. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement.

  Recently Added Patents
Converter and measuring apparatus
Cooking device and method of manufacture of the same
Medical injector
Apparatus and method for image reconstruction and CT system
Managing aging of silicon in an integrated circuit device
Method for counting and segmenting viral particles in an image
Systems and methods for adaptive blind mode equalization
  Randomly Featured Patents
Control circuit for capacitor discharge ignition system
Engine idling speed controlling system
Method and apparatus for electro-coagulation printing and electrode control unit
Shielding device for an electronic apparatus
Adjustable sail head tensioning device, and methods of fabricating and utilizing same
Music box
Circuit arrays having cells with combinations of transistors and nanotube switching elements
Room temperature quick curable organopolysiloxane composition excellent in water resistance
Method and system for determining a three dimensional representation of a tubular organ
Method and device for regrinding grooved tools