Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process










Image Number 9 for United States Patent #7189498.

The present invention provides methods and apparatus for accomplishing a strong phase shift direct write lithography process using reconfigurable optical mirrors. A maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used to generate strong phase shift optical patterns which are directed onto a photoimageable layer of a substrate in order to facilitate pattern transfer. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement.








 
 
  Recently Added Patents
High performance actuator motor
Landscape post for solar and other light fixtures
Visual universal decryption apparatus and methods
SONOS stack with split nitride memory layer
Systems and methods for generating customized user interfaces
Power supply system for a data storage system and a method of controlling a power supply
Lock
  Randomly Featured Patents
System and method for providing objectified image renderings using recognition information from images
7 to 3 counter circuit
Apparatus for building a tobacco stream
Child bike seat
Diamond
Showerhead
Filter assembly with lockable lug means
Printing apparatus with toner projection means
Multiple domain liquid crystal display having a cell thickness divided by helical pitch equal to 1/8 or less
Tractor with improved valve system