Resources Contact Us Home
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process

Image Number 9 for United States Patent #7189498.

The present invention provides methods and apparatus for accomplishing a strong phase shift direct write lithography process using reconfigurable optical mirrors. A maskless lithography system is provided. The maskless direct-write lithography system provided uses an array of mirrors configured to operate in a tilting mode, a piston-displacement mode, or both in combination. The controlled mirror array is used to generate strong phase shift optical patterns which are directed onto a photoimageable layer of a substrate in order to facilitate pattern transfer. In order to avoid constraining the system to forming edges of patterns aligned with the array of mirrors, gray-scale techniques are used for subpixel feature placement.

  Recently Added Patents
Method and system for shared high speed cache in SAS switches
Computer system and volume migration control method using the same
Myoglobin blooming agents, films, packages and methods for packaging
Modular utility rack
Method and apparatus for encoding and decoding video based on first sub-pixel unit and second sub-pixel unit
Methods and systems for automatically identifying a logical circuit failure in a data network
Illumination unit for a direct-view display
  Randomly Featured Patents
Vehicle having a closure system
Shield structure of electronic equipment
Partition system
Tilted gantry image correction for a multislice computed tomography system
Wiring panel for motor vehicles
Wind driven power system
Systems and methods for compressing files for storage and operation on compressed files
Method and apparatus for packaging an integrated chip and antenna
Method of manufacturing pressure vessels by heat forming
Field frame switcher